The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering

Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investiga...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Cao, Hong [verfasserIn] Zhang, ChuanJun [verfasserIn] Chu, JunHao [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2014

Schlagwörter:	molybdenum thin films magnetron sputtering back contact solar cell

Übergeordnetes Werk:	Enthalten in: Science in China - Heidelberg : Springer, 1997, 57(2014), 5 vom: 22. Apr., Seite 947-952
Übergeordnetes Werk:	volume:57 ; year:2014 ; number:5 ; day:22 ; month:04 ; pages:947-952

Links:	Volltext

DOI / URN:	10.1007/s11431-014-5537-x

Katalog-ID:	SPR01928358X

Internformat


LEADER	01000caa a22002652 4500
001	SPR01928358X
003	DE-627
005	20220111065433.0
007	cr uuu---uuuuu
008	201006s2014 xx \|\|\|\|\|o 00\| \|\|eng c
024	7		\|a 10.1007/s11431-014-5537-x \|2 doi
035			\|a (DE-627)SPR01928358X
035			\|a (SPR)s11431-014-5537-x-e
040			\|a DE-627 \|b ger \|c DE-627 \|e rakwb
041			\|a eng
082	0	4	\|a 600 \|q ASE
082	0	4	\|a 600 \|q ASE
084			\|a 50.00 \|2 bkl
100	1		\|a Cao, Hong \|e verfasserin \|4 aut
245	1	4	\|a The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
264		1	\|c 2014
336			\|a Text \|b txt \|2 rdacontent
337			\|a Computermedien \|b c \|2 rdamedia
338			\|a Online-Ressource \|b cr \|2 rdacarrier
520			\|a Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased.
650		4	\|a molybdenum thin films \|7 (dpeaa)DE-He213
650		4	\|a magnetron sputtering \|7 (dpeaa)DE-He213
650		4	\|a back contact \|7 (dpeaa)DE-He213
650		4	\|a solar cell \|7 (dpeaa)DE-He213
700	1		\|a Zhang, ChuanJun \|e verfasserin \|4 aut
700	1		\|a Chu, JunHao \|e verfasserin \|4 aut
773	0	8	\|i Enthalten in \|t Science in China \|d Heidelberg : Springer, 1997 \|g 57(2014), 5 vom: 22. Apr., Seite 947-952 \|w (DE-627)385614756 \|w (DE-600)2142897-9 \|x 1862-281X \|7 nnns
773	1	8	\|g volume:57 \|g year:2014 \|g number:5 \|g day:22 \|g month:04 \|g pages:947-952
856	4	0	\|u https://dx.doi.org/10.1007/s11431-014-5537-x \|z lizenzpflichtig \|3 Volltext
912			\|a GBV_USEFLAG_A
912			\|a SYSFLAG_A
912			\|a GBV_SPRINGER
912			\|a GBV_ILN_20
912			\|a GBV_ILN_22
912			\|a GBV_ILN_23
912			\|a GBV_ILN_24
912			\|a GBV_ILN_31
912			\|a GBV_ILN_32
912			\|a GBV_ILN_39
912			\|a GBV_ILN_40
912			\|a GBV_ILN_60
912			\|a GBV_ILN_62
912			\|a GBV_ILN_65
912			\|a GBV_ILN_69
912			\|a GBV_ILN_70
912			\|a GBV_ILN_73
912			\|a GBV_ILN_74
912			\|a GBV_ILN_90
912			\|a GBV_ILN_95
912			\|a GBV_ILN_100
912			\|a GBV_ILN_105
912			\|a GBV_ILN_110
912			\|a GBV_ILN_120
912			\|a GBV_ILN_138
912			\|a GBV_ILN_152
912			\|a GBV_ILN_161
912			\|a GBV_ILN_171
912			\|a GBV_ILN_187
912			\|a GBV_ILN_224
912			\|a GBV_ILN_250
912			\|a GBV_ILN_281
912			\|a GBV_ILN_285
912			\|a GBV_ILN_293
912			\|a GBV_ILN_370
912			\|a GBV_ILN_602
912			\|a GBV_ILN_702
936	b	k	\|a 50.00 \|q ASE
951			\|a AR
952			\|d 57 \|j 2014 \|e 5 \|b 22 \|c 04 \|h 947-952

Indexfelder

author_variant	h c hc c z cz j c jc
matchkey_str	article:1862281X:2014----::hefcowrigapesradeoiinoeoterprisfoydnmimd
hierarchy_sort_str	2014
bklnumber	50.00
publishDate	2014
allfields	10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952
spelling	10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952
allfields_unstemmed	10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952
allfieldsGer	10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952
allfieldsSound	10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952
language	English
source	Enthalten in Science in China 57(2014), 5 vom: 22. Apr., Seite 947-952 volume:57 year:2014 number:5 day:22 month:04 pages:947-952
sourceStr	Enthalten in Science in China 57(2014), 5 vom: 22. Apr., Seite 947-952 volume:57 year:2014 number:5 day:22 month:04 pages:947-952
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	molybdenum thin films magnetron sputtering back contact solar cell
dewey-raw	600
isfreeaccess_bool	false
container_title	Science in China
authorswithroles_txt_mv	Cao, Hong @@aut@@ Zhang, ChuanJun @@aut@@ Chu, JunHao @@aut@@
publishDateDaySort_date	2014-04-22T00:00:00Z
hierarchy_top_id	385614756
dewey-sort	3600
id	SPR01928358X
language_de	englisch
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">SPR01928358X</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20220111065433.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">201006s2014 xx \|\|\|\|\|o 00\| \|\|eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/s11431-014-5537-x</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)SPR01928358X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(SPR)s11431-014-5537-x-e</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">600</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">600</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">50.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Cao, Hong</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="4"><subfield code="a">The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">molybdenum thin films</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">magnetron sputtering</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">back contact</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">solar cell</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Zhang, ChuanJun</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chu, JunHao</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Science in China</subfield><subfield code="d">Heidelberg : Springer, 1997</subfield><subfield code="g">57(2014), 5 vom: 22. Apr., Seite 947-952</subfield><subfield code="w">(DE-627)385614756</subfield><subfield code="w">(DE-600)2142897-9</subfield><subfield code="x">1862-281X</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:57</subfield><subfield code="g">year:2014</subfield><subfield code="g">number:5</subfield><subfield code="g">day:22</subfield><subfield code="g">month:04</subfield><subfield code="g">pages:947-952</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://dx.doi.org/10.1007/s11431-014-5537-x</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_SPRINGER</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_23</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_24</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_31</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_39</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_60</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_62</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_65</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_69</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_73</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_74</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_90</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_95</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_100</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_105</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_110</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_120</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_138</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_152</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_161</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_171</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_187</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_224</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_250</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_281</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_285</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_293</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_370</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_602</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_702</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">50.00</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">57</subfield><subfield code="j">2014</subfield><subfield code="e">5</subfield><subfield code="b">22</subfield><subfield code="c">04</subfield><subfield code="h">947-952</subfield></datafield></record></collection>
author	Cao, Hong
spellingShingle	Cao, Hong ddc 600 bkl 50.00 misc molybdenum thin films misc magnetron sputtering misc back contact misc solar cell The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
authorStr	Cao, Hong
ppnlink_with_tag_str_mv	@@773@@(DE-627)385614756
format	electronic Article
dewey-ones	600 - Technology
delete_txt_mv	keep
author_role	aut aut aut
collection	springer
remote_str	true
illustrated	Not Illustrated
issn	1862-281X
topic_title	600 ASE 50.00 bkl The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213
topic	ddc 600 bkl 50.00 misc molybdenum thin films misc magnetron sputtering misc back contact misc solar cell
topic_unstemmed	ddc 600 bkl 50.00 misc molybdenum thin films misc magnetron sputtering misc back contact misc solar cell
topic_browse	ddc 600 bkl 50.00 misc molybdenum thin films misc magnetron sputtering misc back contact misc solar cell
format_facet	Elektronische Aufsätze Aufsätze Elektronische Ressource
format_main_str_mv	Text Zeitschrift/Artikel
carriertype_str_mv	cr
hierarchy_parent_title	Science in China
hierarchy_parent_id	385614756
dewey-tens	600 - Technology
hierarchy_top_title	Science in China
isfreeaccess_txt	false
familylinks_str_mv	(DE-627)385614756 (DE-600)2142897-9
title	The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
ctrlnum	(DE-627)SPR01928358X (SPR)s11431-014-5537-x-e
title_full	The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
author_sort	Cao, Hong
journal	Science in China
journalStr	Science in China
lang_code	eng
isOA_bool	false
dewey-hundreds	600 - Technology
recordtype	marc
publishDateSort	2014
contenttype_str_mv	txt
container_start_page	947
author_browse	Cao, Hong Zhang, ChuanJun Chu, JunHao
container_volume	57
class	600 ASE 50.00 bkl
format_se	Elektronische Aufsätze
author-letter	Cao, Hong
doi_str_mv	10.1007/s11431-014-5537-x
dewey-full	600
author2-role	verfasserin
title_sort	effect of working gas pressure and deposition power on the properties of molybdenum films deposited by dc magnetron sputtering
title_auth	The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
abstract	Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased.
abstractGer	Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased.
abstract_unstemmed	Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased.
collection_details	GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702
container_issue	5
title_short	The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
url	https://dx.doi.org/10.1007/s11431-014-5537-x
remote_bool	true
author2	Zhang, ChuanJun Chu, JunHao
author2Str	Zhang, ChuanJun Chu, JunHao
ppnlink	385614756
mediatype_str_mv	c
isOA_txt	false
hochschulschrift_bool	false
doi_str	10.1007/s11431-014-5537-x
up_date	2024-07-04T00:57:20.609Z
_version_	1803608014836465664
fullrecord_marcxml	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">SPR01928358X</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20220111065433.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">201006s2014 xx \|\|\|\|\|o 00\| \|\|eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/s11431-014-5537-x</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)SPR01928358X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(SPR)s11431-014-5537-x-e</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">600</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">600</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">50.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Cao, Hong</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="4"><subfield code="a">The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">molybdenum thin films</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">magnetron sputtering</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">back contact</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">solar cell</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Zhang, ChuanJun</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chu, JunHao</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Science in China</subfield><subfield code="d">Heidelberg : Springer, 1997</subfield><subfield code="g">57(2014), 5 vom: 22. Apr., Seite 947-952</subfield><subfield code="w">(DE-627)385614756</subfield><subfield code="w">(DE-600)2142897-9</subfield><subfield code="x">1862-281X</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:57</subfield><subfield code="g">year:2014</subfield><subfield code="g">number:5</subfield><subfield code="g">day:22</subfield><subfield code="g">month:04</subfield><subfield code="g">pages:947-952</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://dx.doi.org/10.1007/s11431-014-5537-x</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_SPRINGER</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_23</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_24</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_31</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_39</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_60</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_62</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_65</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_69</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_73</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_74</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_90</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_95</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_100</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_105</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_110</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_120</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_138</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_152</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_161</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_171</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_187</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_224</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_250</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_281</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_285</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_293</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_370</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_602</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_702</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">50.00</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">57</subfield><subfield code="j">2014</subfield><subfield code="e">5</subfield><subfield code="b">22</subfield><subfield code="c">04</subfield><subfield code="h">947-952</subfield></datafield></record></collection>
score	7.400769

Nicht das Richtige dabei?

Schreiben Sie uns!

The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering

Nicht das Richtige dabei?

Zugang & Verfügbarkeit

Vorhandene Bände

Nicht das Richtige dabei?