The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investiga...
Ausführliche Beschreibung
Autor*in: |
Cao, Hong [verfasserIn] Zhang, ChuanJun [verfasserIn] Chu, JunHao [verfasserIn] |
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E-Artikel |
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Sprache: |
Englisch |
Erschienen: |
2014 |
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Übergeordnetes Werk: |
Enthalten in: Science in China - Heidelberg : Springer, 1997, 57(2014), 5 vom: 22. Apr., Seite 947-952 |
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Übergeordnetes Werk: |
volume:57 ; year:2014 ; number:5 ; day:22 ; month:04 ; pages:947-952 |
Links: |
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DOI / URN: |
10.1007/s11431-014-5537-x |
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Katalog-ID: |
SPR01928358X |
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520 | |a Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. | ||
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10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952 |
spelling |
10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952 |
allfields_unstemmed |
10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952 |
allfieldsGer |
10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952 |
allfieldsSound |
10.1007/s11431-014-5537-x doi (DE-627)SPR01928358X (SPR)s11431-014-5537-x-e DE-627 ger DE-627 rakwb eng 600 ASE 600 ASE 50.00 bkl Cao, Hong verfasserin aut The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 Zhang, ChuanJun verfasserin aut Chu, JunHao verfasserin aut Enthalten in Science in China Heidelberg : Springer, 1997 57(2014), 5 vom: 22. Apr., Seite 947-952 (DE-627)385614756 (DE-600)2142897-9 1862-281X nnns volume:57 year:2014 number:5 day:22 month:04 pages:947-952 https://dx.doi.org/10.1007/s11431-014-5537-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 50.00 ASE AR 57 2014 5 22 04 947-952 |
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Cao, Hong ddc 600 bkl 50.00 misc molybdenum thin films misc magnetron sputtering misc back contact misc solar cell The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering |
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600 ASE 50.00 bkl The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering molybdenum thin films (dpeaa)DE-He213 magnetron sputtering (dpeaa)DE-He213 back contact (dpeaa)DE-He213 solar cell (dpeaa)DE-He213 |
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effect of working gas pressure and deposition power on the properties of molybdenum films deposited by dc magnetron sputtering |
title_auth |
The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering |
abstract |
Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. |
abstractGer |
Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. |
abstract_unstemmed |
Abstract Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased. |
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title_short |
The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering |
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