Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis

Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Kate, Ranjit S. [verfasserIn] Bulakhe, Suraj C. Deokate, Ramesh J.

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2019

Schlagwörter:	NiO spray composition electrical properties semiconducting behavior

Anmerkung:	© The Minerals, Metals & Materials Society 2019

Übergeordnetes Werk:	Enthalten in: Journal of electronic materials - Warrendale, Pa : TMS, 1972, 48(2019), 5 vom: 01. März, Seite 3220-3228
Übergeordnetes Werk:	volume:48 ; year:2019 ; number:5 ; day:01 ; month:03 ; pages:3220-3228

Links:	Volltext

DOI / URN:	10.1007/s11664-019-07074-0

Katalog-ID:	SPR021560447

Internformat


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allfields	10.1007/s11664-019-07074-0 doi (DE-627)SPR021560447 (SPR)s11664-019-07074-0-e DE-627 ger DE-627 rakwb eng Kate, Ranjit S. verfasserin aut Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Minerals, Metals & Materials Society 2019 Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. NiO (dpeaa)DE-He213 spray (dpeaa)DE-He213 composition (dpeaa)DE-He213 electrical properties (dpeaa)DE-He213 semiconducting behavior (dpeaa)DE-He213 Bulakhe, Suraj C. aut Deokate, Ramesh J. (orcid)0000-0002-9539-5900 aut Enthalten in Journal of electronic materials Warrendale, Pa : TMS, 1972 48(2019), 5 vom: 01. März, Seite 3220-3228 (DE-627)324918739 (DE-600)2032868-0 1543-186X nnns volume:48 year:2019 number:5 day:01 month:03 pages:3220-3228 https://dx.doi.org/10.1007/s11664-019-07074-0 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 48 2019 5 01 03 3220-3228
spelling	10.1007/s11664-019-07074-0 doi (DE-627)SPR021560447 (SPR)s11664-019-07074-0-e DE-627 ger DE-627 rakwb eng Kate, Ranjit S. verfasserin aut Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Minerals, Metals & Materials Society 2019 Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. NiO (dpeaa)DE-He213 spray (dpeaa)DE-He213 composition (dpeaa)DE-He213 electrical properties (dpeaa)DE-He213 semiconducting behavior (dpeaa)DE-He213 Bulakhe, Suraj C. aut Deokate, Ramesh J. (orcid)0000-0002-9539-5900 aut Enthalten in Journal of electronic materials Warrendale, Pa : TMS, 1972 48(2019), 5 vom: 01. März, Seite 3220-3228 (DE-627)324918739 (DE-600)2032868-0 1543-186X nnns volume:48 year:2019 number:5 day:01 month:03 pages:3220-3228 https://dx.doi.org/10.1007/s11664-019-07074-0 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 48 2019 5 01 03 3220-3228
allfields_unstemmed	10.1007/s11664-019-07074-0 doi (DE-627)SPR021560447 (SPR)s11664-019-07074-0-e DE-627 ger DE-627 rakwb eng Kate, Ranjit S. verfasserin aut Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Minerals, Metals & Materials Society 2019 Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. NiO (dpeaa)DE-He213 spray (dpeaa)DE-He213 composition (dpeaa)DE-He213 electrical properties (dpeaa)DE-He213 semiconducting behavior (dpeaa)DE-He213 Bulakhe, Suraj C. aut Deokate, Ramesh J. (orcid)0000-0002-9539-5900 aut Enthalten in Journal of electronic materials Warrendale, Pa : TMS, 1972 48(2019), 5 vom: 01. März, Seite 3220-3228 (DE-627)324918739 (DE-600)2032868-0 1543-186X nnns volume:48 year:2019 number:5 day:01 month:03 pages:3220-3228 https://dx.doi.org/10.1007/s11664-019-07074-0 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 48 2019 5 01 03 3220-3228
allfieldsGer	10.1007/s11664-019-07074-0 doi (DE-627)SPR021560447 (SPR)s11664-019-07074-0-e DE-627 ger DE-627 rakwb eng Kate, Ranjit S. verfasserin aut Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Minerals, Metals & Materials Society 2019 Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. NiO (dpeaa)DE-He213 spray (dpeaa)DE-He213 composition (dpeaa)DE-He213 electrical properties (dpeaa)DE-He213 semiconducting behavior (dpeaa)DE-He213 Bulakhe, Suraj C. aut Deokate, Ramesh J. (orcid)0000-0002-9539-5900 aut Enthalten in Journal of electronic materials Warrendale, Pa : TMS, 1972 48(2019), 5 vom: 01. März, Seite 3220-3228 (DE-627)324918739 (DE-600)2032868-0 1543-186X nnns volume:48 year:2019 number:5 day:01 month:03 pages:3220-3228 https://dx.doi.org/10.1007/s11664-019-07074-0 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 48 2019 5 01 03 3220-3228
allfieldsSound	10.1007/s11664-019-07074-0 doi (DE-627)SPR021560447 (SPR)s11664-019-07074-0-e DE-627 ger DE-627 rakwb eng Kate, Ranjit S. verfasserin aut Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Minerals, Metals & Materials Society 2019 Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. NiO (dpeaa)DE-He213 spray (dpeaa)DE-He213 composition (dpeaa)DE-He213 electrical properties (dpeaa)DE-He213 semiconducting behavior (dpeaa)DE-He213 Bulakhe, Suraj C. aut Deokate, Ramesh J. (orcid)0000-0002-9539-5900 aut Enthalten in Journal of electronic materials Warrendale, Pa : TMS, 1972 48(2019), 5 vom: 01. März, Seite 3220-3228 (DE-627)324918739 (DE-600)2032868-0 1543-186X nnns volume:48 year:2019 number:5 day:01 month:03 pages:3220-3228 https://dx.doi.org/10.1007/s11664-019-07074-0 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 48 2019 5 01 03 3220-3228
language	English
source	Enthalten in Journal of electronic materials 48(2019), 5 vom: 01. März, Seite 3220-3228 volume:48 year:2019 number:5 day:01 month:03 pages:3220-3228
sourceStr	Enthalten in Journal of electronic materials 48(2019), 5 vom: 01. März, Seite 3220-3228 volume:48 year:2019 number:5 day:01 month:03 pages:3220-3228
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	NiO spray composition electrical properties semiconducting behavior
isfreeaccess_bool	false
container_title	Journal of electronic materials
authorswithroles_txt_mv	Kate, Ranjit S. @@aut@@ Bulakhe, Suraj C. @@aut@@ Deokate, Ramesh J. @@aut@@
publishDateDaySort_date	2019-03-01T00:00:00Z
hierarchy_top_id	324918739
id	SPR021560447
language_de	englisch
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The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. 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author	Kate, Ranjit S.
spellingShingle	Kate, Ranjit S. misc NiO misc spray misc composition misc electrical properties misc semiconducting behavior Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis
authorStr	Kate, Ranjit S.
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topic_title	Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis NiO (dpeaa)DE-He213 spray (dpeaa)DE-He213 composition (dpeaa)DE-He213 electrical properties (dpeaa)DE-He213 semiconducting behavior (dpeaa)DE-He213
topic	misc NiO misc spray misc composition misc electrical properties misc semiconducting behavior
topic_unstemmed	misc NiO misc spray misc composition misc electrical properties misc semiconducting behavior
topic_browse	misc NiO misc spray misc composition misc electrical properties misc semiconducting behavior
format_facet	Elektronische Aufsätze Aufsätze Elektronische Ressource
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title	Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis
ctrlnum	(DE-627)SPR021560447 (SPR)s11664-019-07074-0-e
title_full	Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis
author_sort	Kate, Ranjit S.
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author_browse	Kate, Ranjit S. Bulakhe, Suraj C. Deokate, Ramesh J.
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author-letter	Kate, Ranjit S.
doi_str_mv	10.1007/s11664-019-07074-0
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title_sort	effect of substrate temperature on properties of nickel oxide (nio) thin films by spray pyrolysis
title_auth	Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis
abstract	Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. © The Minerals, Metals & Materials Society 2019
abstractGer	Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. © The Minerals, Metals & Materials Society 2019
abstract_unstemmed	Abstract NiO thin films were deposited on a glass substrate and investigated for the physical properties optimized through substrate temperature (350–390°C) using a spray pyrolysis technique. The effect of substrate temperature on deposited NiO thin film was studied by thermogravimetric analysis and differential thermal analysis, X-diffraction (XRD), field electron scanning electron microscopy, optical absorption and electrical measurement techniques. XRD analysis indicates that NiO thin films are of a polycrystalline cubic structure. Optical properties are calculated with help of transmittance and absorbance data in the wavelength range between 200 nm and 900 nm. The optical band gap energy values increased from 3.1 eV to 4.0 eV with substrate temperature. Further, the extinction coefficient, refractive index, and real and imaginary parts of dielectric constant and optical conductivities of NiO thin films were calculated. The electrical resistivity measurement shows conductivity of the NiO thin film increased with increase in substrate temperature. © The Minerals, Metals & Materials Society 2019
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container_issue	5
title_short	Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis
url	https://dx.doi.org/10.1007/s11664-019-07074-0
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author2	Bulakhe, Suraj C. Deokate, Ramesh J.
author2Str	Bulakhe, Suraj C. Deokate, Ramesh J.
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doi_str	10.1007/s11664-019-07074-0
up_date	2024-07-03T23:18:42.146Z
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Effect of Substrate Temperature on Properties of Nickel Oxide (NiO) Thin Films by Spray Pyrolysis

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