Porous silicon functionalization for possible arsenic adsorption

Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) t...
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Autor*in:	Balderas-Valadez, Ruth Fabiola [verfasserIn] Agarwal, Vivechana [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2014

Schlagwörter:	Arsenic Porous silicon DMSA Adsorption

Übergeordnetes Werk:	Enthalten in: Nanoscale research letters - New York, NY [u.a.] : Springer, 2006, 9(2014), 1 vom: 17. Sept.
Übergeordnetes Werk:	volume:9 ; year:2014 ; number:1 ; day:17 ; month:09

Links:	Volltext

DOI / URN:	10.1186/1556-276X-9-508

Katalog-ID:	SPR021878293

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520			\|a Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates.
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allfields	10.1186/1556-276X-9-508 doi (DE-627)SPR021878293 (SPR)1556-276X-9-508-e DE-627 ger DE-627 rakwb eng 600 ASE Balderas-Valadez, Ruth Fabiola verfasserin aut Porous silicon functionalization for possible arsenic adsorption 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates. Arsenic (dpeaa)DE-He213 Porous silicon (dpeaa)DE-He213 DMSA (dpeaa)DE-He213 Adsorption (dpeaa)DE-He213 Agarwal, Vivechana verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 9(2014), 1 vom: 17. Sept. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:9 year:2014 number:1 day:17 month:09 https://dx.doi.org/10.1186/1556-276X-9-508 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2014 1 17 09
spelling	10.1186/1556-276X-9-508 doi (DE-627)SPR021878293 (SPR)1556-276X-9-508-e DE-627 ger DE-627 rakwb eng 600 ASE Balderas-Valadez, Ruth Fabiola verfasserin aut Porous silicon functionalization for possible arsenic adsorption 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates. Arsenic (dpeaa)DE-He213 Porous silicon (dpeaa)DE-He213 DMSA (dpeaa)DE-He213 Adsorption (dpeaa)DE-He213 Agarwal, Vivechana verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 9(2014), 1 vom: 17. Sept. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:9 year:2014 number:1 day:17 month:09 https://dx.doi.org/10.1186/1556-276X-9-508 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2014 1 17 09
allfields_unstemmed	10.1186/1556-276X-9-508 doi (DE-627)SPR021878293 (SPR)1556-276X-9-508-e DE-627 ger DE-627 rakwb eng 600 ASE Balderas-Valadez, Ruth Fabiola verfasserin aut Porous silicon functionalization for possible arsenic adsorption 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates. Arsenic (dpeaa)DE-He213 Porous silicon (dpeaa)DE-He213 DMSA (dpeaa)DE-He213 Adsorption (dpeaa)DE-He213 Agarwal, Vivechana verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 9(2014), 1 vom: 17. Sept. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:9 year:2014 number:1 day:17 month:09 https://dx.doi.org/10.1186/1556-276X-9-508 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2014 1 17 09
allfieldsGer	10.1186/1556-276X-9-508 doi (DE-627)SPR021878293 (SPR)1556-276X-9-508-e DE-627 ger DE-627 rakwb eng 600 ASE Balderas-Valadez, Ruth Fabiola verfasserin aut Porous silicon functionalization for possible arsenic adsorption 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates. Arsenic (dpeaa)DE-He213 Porous silicon (dpeaa)DE-He213 DMSA (dpeaa)DE-He213 Adsorption (dpeaa)DE-He213 Agarwal, Vivechana verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 9(2014), 1 vom: 17. Sept. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:9 year:2014 number:1 day:17 month:09 https://dx.doi.org/10.1186/1556-276X-9-508 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2014 1 17 09
allfieldsSound	10.1186/1556-276X-9-508 doi (DE-627)SPR021878293 (SPR)1556-276X-9-508-e DE-627 ger DE-627 rakwb eng 600 ASE Balderas-Valadez, Ruth Fabiola verfasserin aut Porous silicon functionalization for possible arsenic adsorption 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates. Arsenic (dpeaa)DE-He213 Porous silicon (dpeaa)DE-He213 DMSA (dpeaa)DE-He213 Adsorption (dpeaa)DE-He213 Agarwal, Vivechana verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 9(2014), 1 vom: 17. Sept. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:9 year:2014 number:1 day:17 month:09 https://dx.doi.org/10.1186/1556-276X-9-508 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2014 1 17 09
language	English
source	Enthalten in Nanoscale research letters 9(2014), 1 vom: 17. Sept. volume:9 year:2014 number:1 day:17 month:09
sourceStr	Enthalten in Nanoscale research letters 9(2014), 1 vom: 17. Sept. volume:9 year:2014 number:1 day:17 month:09
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institution	findex.gbv.de
topic_facet	Arsenic Porous silicon DMSA Adsorption
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container_title	Nanoscale research letters
authorswithroles_txt_mv	Balderas-Valadez, Ruth Fabiola @@aut@@ Agarwal, Vivechana @@aut@@
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author	Balderas-Valadez, Ruth Fabiola
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topic_title	600 ASE Porous silicon functionalization for possible arsenic adsorption Arsenic (dpeaa)DE-He213 Porous silicon (dpeaa)DE-He213 DMSA (dpeaa)DE-He213 Adsorption (dpeaa)DE-He213
topic	ddc 600 misc Arsenic misc Porous silicon misc DMSA misc Adsorption
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title	Porous silicon functionalization for possible arsenic adsorption
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title_full	Porous silicon functionalization for possible arsenic adsorption
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title_sort	porous silicon functionalization for possible arsenic adsorption
title_auth	Porous silicon functionalization for possible arsenic adsorption
abstract	Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates.
abstractGer	Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates.
abstract_unstemmed	Abstract Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evaluate the relative response for DMSA attachment. The aminosilane-modified PS samples were attached to DMSA by wet impregnation followed by the adsorption of As (III). Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) have been used to identify the functional groups and to estimate the As (III) content, respectively. FTIR spectroscopy confirmed the covalent bonding of DMSA with amide and R-COOH groups on the nanostructured porous surface. XPS confirms the preferred arsenic adsorption on the surface of PS/DMSA samples as compared to the aminosilane-modified and bare PS substrates.
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title_short	Porous silicon functionalization for possible arsenic adsorption
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Porous silicon functionalization for possible arsenic adsorption

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