One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calcula...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Tan, Xianhua [verfasserIn] Shi, Tielin [verfasserIn] Lin, Jianbin [verfasserIn] Sun, Bo [verfasserIn] Tang, Zirong [verfasserIn] Liao, Guanglan [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2018

Schlagwörter:	Three-dimensional suspended structure Diffraction Carbon microelectromechanical systems Pyrolytic carbon structures

Übergeordnetes Werk:	Enthalten in: Nanoscale research letters - New York, NY [u.a.] : Springer, 2006, 13(2018), 1 vom: 05. Dez.
Übergeordnetes Werk:	volume:13 ; year:2018 ; number:1 ; day:05 ; month:12

Links:	Volltext

DOI / URN:	10.1186/s11671-018-2817-6

Katalog-ID:	SPR022102019

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520			\|a Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices.
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allfields	10.1186/s11671-018-2817-6 doi (DE-627)SPR022102019 (SPR)s11671-018-2817-6-e DE-627 ger DE-627 rakwb eng 600 ASE Tan, Xianhua verfasserin aut One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures 2018 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices. Three-dimensional suspended structure (dpeaa)DE-He213 Diffraction (dpeaa)DE-He213 Carbon microelectromechanical systems (dpeaa)DE-He213 Pyrolytic carbon structures (dpeaa)DE-He213 Shi, Tielin verfasserin aut Lin, Jianbin verfasserin aut Sun, Bo verfasserin aut Tang, Zirong verfasserin aut Liao, Guanglan verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 13(2018), 1 vom: 05. Dez. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:13 year:2018 number:1 day:05 month:12 https://dx.doi.org/10.1186/s11671-018-2817-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 13 2018 1 05 12
spelling	10.1186/s11671-018-2817-6 doi (DE-627)SPR022102019 (SPR)s11671-018-2817-6-e DE-627 ger DE-627 rakwb eng 600 ASE Tan, Xianhua verfasserin aut One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures 2018 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices. Three-dimensional suspended structure (dpeaa)DE-He213 Diffraction (dpeaa)DE-He213 Carbon microelectromechanical systems (dpeaa)DE-He213 Pyrolytic carbon structures (dpeaa)DE-He213 Shi, Tielin verfasserin aut Lin, Jianbin verfasserin aut Sun, Bo verfasserin aut Tang, Zirong verfasserin aut Liao, Guanglan verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 13(2018), 1 vom: 05. Dez. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:13 year:2018 number:1 day:05 month:12 https://dx.doi.org/10.1186/s11671-018-2817-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 13 2018 1 05 12
allfields_unstemmed	10.1186/s11671-018-2817-6 doi (DE-627)SPR022102019 (SPR)s11671-018-2817-6-e DE-627 ger DE-627 rakwb eng 600 ASE Tan, Xianhua verfasserin aut One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures 2018 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices. Three-dimensional suspended structure (dpeaa)DE-He213 Diffraction (dpeaa)DE-He213 Carbon microelectromechanical systems (dpeaa)DE-He213 Pyrolytic carbon structures (dpeaa)DE-He213 Shi, Tielin verfasserin aut Lin, Jianbin verfasserin aut Sun, Bo verfasserin aut Tang, Zirong verfasserin aut Liao, Guanglan verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 13(2018), 1 vom: 05. Dez. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:13 year:2018 number:1 day:05 month:12 https://dx.doi.org/10.1186/s11671-018-2817-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 13 2018 1 05 12
allfieldsGer	10.1186/s11671-018-2817-6 doi (DE-627)SPR022102019 (SPR)s11671-018-2817-6-e DE-627 ger DE-627 rakwb eng 600 ASE Tan, Xianhua verfasserin aut One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures 2018 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices. Three-dimensional suspended structure (dpeaa)DE-He213 Diffraction (dpeaa)DE-He213 Carbon microelectromechanical systems (dpeaa)DE-He213 Pyrolytic carbon structures (dpeaa)DE-He213 Shi, Tielin verfasserin aut Lin, Jianbin verfasserin aut Sun, Bo verfasserin aut Tang, Zirong verfasserin aut Liao, Guanglan verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 13(2018), 1 vom: 05. Dez. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:13 year:2018 number:1 day:05 month:12 https://dx.doi.org/10.1186/s11671-018-2817-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 13 2018 1 05 12
allfieldsSound	10.1186/s11671-018-2817-6 doi (DE-627)SPR022102019 (SPR)s11671-018-2817-6-e DE-627 ger DE-627 rakwb eng 600 ASE Tan, Xianhua verfasserin aut One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures 2018 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices. Three-dimensional suspended structure (dpeaa)DE-He213 Diffraction (dpeaa)DE-He213 Carbon microelectromechanical systems (dpeaa)DE-He213 Pyrolytic carbon structures (dpeaa)DE-He213 Shi, Tielin verfasserin aut Lin, Jianbin verfasserin aut Sun, Bo verfasserin aut Tang, Zirong verfasserin aut Liao, Guanglan verfasserin aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 13(2018), 1 vom: 05. Dez. (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:13 year:2018 number:1 day:05 month:12 https://dx.doi.org/10.1186/s11671-018-2817-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2027 GBV_ILN_2055 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 13 2018 1 05 12
language	English
source	Enthalten in Nanoscale research letters 13(2018), 1 vom: 05. Dez. volume:13 year:2018 number:1 day:05 month:12
sourceStr	Enthalten in Nanoscale research letters 13(2018), 1 vom: 05. Dez. volume:13 year:2018 number:1 day:05 month:12
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	Three-dimensional suspended structure Diffraction Carbon microelectromechanical systems Pyrolytic carbon structures
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isfreeaccess_bool	true
container_title	Nanoscale research letters
authorswithroles_txt_mv	Tan, Xianhua @@aut@@ Shi, Tielin @@aut@@ Lin, Jianbin @@aut@@ Sun, Bo @@aut@@ Tang, Zirong @@aut@@ Liao, Guanglan @@aut@@
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author	Tan, Xianhua
spellingShingle	Tan, Xianhua ddc 600 misc Three-dimensional suspended structure misc Diffraction misc Carbon microelectromechanical systems misc Pyrolytic carbon structures One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
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topic_title	600 ASE One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures Three-dimensional suspended structure (dpeaa)DE-He213 Diffraction (dpeaa)DE-He213 Carbon microelectromechanical systems (dpeaa)DE-He213 Pyrolytic carbon structures (dpeaa)DE-He213
topic	ddc 600 misc Three-dimensional suspended structure misc Diffraction misc Carbon microelectromechanical systems misc Pyrolytic carbon structures
topic_unstemmed	ddc 600 misc Three-dimensional suspended structure misc Diffraction misc Carbon microelectromechanical systems misc Pyrolytic carbon structures
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title	One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
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title_full	One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
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title_sort	one-step mask-based diffraction lithography for the fabrication of 3d suspended structures
title_auth	One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
abstract	Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices.
abstractGer	Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices.
abstract_unstemmed	Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices.
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title_short	One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
url	https://dx.doi.org/10.1186/s11671-018-2817-6
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author2	Shi, Tielin Lin, Jianbin Sun, Bo Tang, Zirong Liao, Guanglan
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up_date	2024-07-04T01:48:31.916Z
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