Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity

Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous...
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Autor*in:	Wang, Shenghung [verfasserIn] Wang, Kuohua Jehng, Jihmirn Liu, Lichen

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2011

Schlagwörter:	photocatalyst titanium dioxide MCM-41 plasma enhanced chemical vapor deposition (PECVD)

Anmerkung:	© Higher Education Press and Springer-Verlag Berlin Heidelberg 2011

Übergeordnetes Werk:	Enthalten in: Frontiers of environmental science & engineering in China - Beijing : Higher Education Press, 2007, 6(2011), 3 vom: 02. Mai, Seite 304-312
Übergeordnetes Werk:	volume:6 ; year:2011 ; number:3 ; day:02 ; month:05 ; pages:304-312

Links:	Volltext

DOI / URN:	10.1007/s11783-010-0297-8

Katalog-ID:	SPR022393838

Internformat


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520			\|a Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%.
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allfields	10.1007/s11783-010-0297-8 doi (DE-627)SPR022393838 (SPR)s11783-010-0297-8-e DE-627 ger DE-627 rakwb eng Wang, Shenghung verfasserin aut Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011 Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. photocatalyst (dpeaa)DE-He213 titanium dioxide (dpeaa)DE-He213 MCM-41 (dpeaa)DE-He213 plasma enhanced chemical vapor deposition (PECVD) (dpeaa)DE-He213 Wang, Kuohua aut Jehng, Jihmirn aut Liu, Lichen aut Enthalten in Frontiers of environmental science & engineering in China Beijing : Higher Education Press, 2007 6(2011), 3 vom: 02. Mai, Seite 304-312 (DE-627)545787661 (DE-600)2388869-6 1673-7520 nnns volume:6 year:2011 number:3 day:02 month:05 pages:304-312 https://dx.doi.org/10.1007/s11783-010-0297-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2059 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2111 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 AR 6 2011 3 02 05 304-312
spelling	10.1007/s11783-010-0297-8 doi (DE-627)SPR022393838 (SPR)s11783-010-0297-8-e DE-627 ger DE-627 rakwb eng Wang, Shenghung verfasserin aut Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011 Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. photocatalyst (dpeaa)DE-He213 titanium dioxide (dpeaa)DE-He213 MCM-41 (dpeaa)DE-He213 plasma enhanced chemical vapor deposition (PECVD) (dpeaa)DE-He213 Wang, Kuohua aut Jehng, Jihmirn aut Liu, Lichen aut Enthalten in Frontiers of environmental science & engineering in China Beijing : Higher Education Press, 2007 6(2011), 3 vom: 02. Mai, Seite 304-312 (DE-627)545787661 (DE-600)2388869-6 1673-7520 nnns volume:6 year:2011 number:3 day:02 month:05 pages:304-312 https://dx.doi.org/10.1007/s11783-010-0297-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2059 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2111 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 AR 6 2011 3 02 05 304-312
allfields_unstemmed	10.1007/s11783-010-0297-8 doi (DE-627)SPR022393838 (SPR)s11783-010-0297-8-e DE-627 ger DE-627 rakwb eng Wang, Shenghung verfasserin aut Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011 Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. photocatalyst (dpeaa)DE-He213 titanium dioxide (dpeaa)DE-He213 MCM-41 (dpeaa)DE-He213 plasma enhanced chemical vapor deposition (PECVD) (dpeaa)DE-He213 Wang, Kuohua aut Jehng, Jihmirn aut Liu, Lichen aut Enthalten in Frontiers of environmental science & engineering in China Beijing : Higher Education Press, 2007 6(2011), 3 vom: 02. Mai, Seite 304-312 (DE-627)545787661 (DE-600)2388869-6 1673-7520 nnns volume:6 year:2011 number:3 day:02 month:05 pages:304-312 https://dx.doi.org/10.1007/s11783-010-0297-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2059 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2111 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 AR 6 2011 3 02 05 304-312
allfieldsGer	10.1007/s11783-010-0297-8 doi (DE-627)SPR022393838 (SPR)s11783-010-0297-8-e DE-627 ger DE-627 rakwb eng Wang, Shenghung verfasserin aut Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011 Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. photocatalyst (dpeaa)DE-He213 titanium dioxide (dpeaa)DE-He213 MCM-41 (dpeaa)DE-He213 plasma enhanced chemical vapor deposition (PECVD) (dpeaa)DE-He213 Wang, Kuohua aut Jehng, Jihmirn aut Liu, Lichen aut Enthalten in Frontiers of environmental science & engineering in China Beijing : Higher Education Press, 2007 6(2011), 3 vom: 02. Mai, Seite 304-312 (DE-627)545787661 (DE-600)2388869-6 1673-7520 nnns volume:6 year:2011 number:3 day:02 month:05 pages:304-312 https://dx.doi.org/10.1007/s11783-010-0297-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2059 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2111 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 AR 6 2011 3 02 05 304-312
allfieldsSound	10.1007/s11783-010-0297-8 doi (DE-627)SPR022393838 (SPR)s11783-010-0297-8-e DE-627 ger DE-627 rakwb eng Wang, Shenghung verfasserin aut Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011 Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. photocatalyst (dpeaa)DE-He213 titanium dioxide (dpeaa)DE-He213 MCM-41 (dpeaa)DE-He213 plasma enhanced chemical vapor deposition (PECVD) (dpeaa)DE-He213 Wang, Kuohua aut Jehng, Jihmirn aut Liu, Lichen aut Enthalten in Frontiers of environmental science & engineering in China Beijing : Higher Education Press, 2007 6(2011), 3 vom: 02. Mai, Seite 304-312 (DE-627)545787661 (DE-600)2388869-6 1673-7520 nnns volume:6 year:2011 number:3 day:02 month:05 pages:304-312 https://dx.doi.org/10.1007/s11783-010-0297-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_152 GBV_ILN_161 GBV_ILN_171 GBV_ILN_187 GBV_ILN_224 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2059 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2111 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 AR 6 2011 3 02 05 304-312
language	English
source	Enthalten in Frontiers of environmental science & engineering in China 6(2011), 3 vom: 02. Mai, Seite 304-312 volume:6 year:2011 number:3 day:02 month:05 pages:304-312
sourceStr	Enthalten in Frontiers of environmental science & engineering in China 6(2011), 3 vom: 02. Mai, Seite 304-312 volume:6 year:2011 number:3 day:02 month:05 pages:304-312
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	photocatalyst titanium dioxide MCM-41 plasma enhanced chemical vapor deposition (PECVD)
isfreeaccess_bool	false
container_title	Frontiers of environmental science & engineering in China
authorswithroles_txt_mv	Wang, Shenghung @@aut@@ Wang, Kuohua @@aut@@ Jehng, Jihmirn @@aut@@ Liu, Lichen @@aut@@
publishDateDaySort_date	2011-05-02T00:00:00Z
hierarchy_top_id	545787661
id	SPR022393838
language_de	englisch
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author	Wang, Shenghung
spellingShingle	Wang, Shenghung misc photocatalyst misc titanium dioxide misc MCM-41 misc plasma enhanced chemical vapor deposition (PECVD) Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity
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topic_title	Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity photocatalyst (dpeaa)DE-He213 titanium dioxide (dpeaa)DE-He213 MCM-41 (dpeaa)DE-He213 plasma enhanced chemical vapor deposition (PECVD) (dpeaa)DE-He213
topic	misc photocatalyst misc titanium dioxide misc MCM-41 misc plasma enhanced chemical vapor deposition (PECVD)
topic_unstemmed	misc photocatalyst misc titanium dioxide misc MCM-41 misc plasma enhanced chemical vapor deposition (PECVD)
topic_browse	misc photocatalyst misc titanium dioxide misc MCM-41 misc plasma enhanced chemical vapor deposition (PECVD)
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title	Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity
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title_full	Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity
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journal	Frontiers of environmental science & engineering in China
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author_browse	Wang, Shenghung Wang, Kuohua Jehng, Jihmirn Liu, Lichen
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doi_str_mv	10.1007/s11783-010-0297-8
title_sort	preparation of $ tio_{2} $/mcm-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity
title_auth	Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity
abstract	Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011
abstractGer	Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011
abstract_unstemmed	Abstract Titanium dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD) method using titanium isopropoxide (TTIP) as a precursor. Annealing temperature is a key factor affecting crystal phase of titanium dioxide. It will transform an amorphous structure to a polycrystalline structure by increasing temperature. The optimum anatase phase of $ TiO_{2} $ which can acquire the best methanol conversion under UV-light irradiation is obtained under an annealing temperature of 700°C for 2 h, substrate temperature of 500°C, 70 mL·$ min^{−1} $ of oxygen flow rate, and 100W of plasma power. In addition, the films are composed of an anatase-rutile mixed phase, and the ratio of anatase to rutile varies with substrate temperature and oxygen flow rate. The particle sizes of titanium dioxide are between 30.3 nm and 59.9 nm by the calculation of Scherrer equation. Under the reaction conditions of 116.8 mg·$ L^{-1} $ methanol, 2.9 mg·$ L^{−1} $ moisture, and 75°C of reaction temperature, the best conversion of methanol with UV-light is 48.2% by using the anatase-rutile (91.3/8.7) mixed phase $ TiO_{2} $ in a batch reactor for 60 min. While under fluorescent light irradiation, the best photoactivity appears by using the anatase-rutile (55.4/44.6) mixed phase $ TiO_{2} $ with a conversion of 40.0%. © Higher Education Press and Springer-Verlag Berlin Heidelberg 2011
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title_short	Preparation of $ TiO_{2} $/MCM-41 by plasma enhanced chemical vapor deposition method and its photocatalytic activity
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