An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining
Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compou...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Vafaie, Reza Hadjiaghaie [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2013 |
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| Schlagwörter: |
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| Anmerkung: |
© The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 |
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| Übergeordnetes Werk: |
Enthalten in: Biotechnology and bioprocess engineering - Seoul : Society, 1996, 18(2013), 3 vom: Juni, Seite 594-605 |
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| Übergeordnetes Werk: |
volume:18 ; year:2013 ; number:3 ; month:06 ; pages:594-605 |
| Links: |
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| DOI / URN: |
10.1007/s12257-012-0431-5 |
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| Katalog-ID: |
SPR024560812 |
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| 245 | 1 | 3 | |a An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining |
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| 520 | |a Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. | ||
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| 650 | 4 | |a electroosmotic flow |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a low Reynolds number flow |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a chaotic regime |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a MEMS-based |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a surface micromachining |7 (dpeaa)DE-He213 | |
| 700 | 1 | |a Mehdipoor, Mahnaz |4 aut | |
| 700 | 1 | |a Pourmand, Adel |4 aut | |
| 700 | 1 | |a Poorreza, Elnaz |4 aut | |
| 700 | 1 | |a Ghavifekr, Habib Badri |4 aut | |
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10.1007/s12257-012-0431-5 doi (DE-627)SPR024560812 (SPR)s12257-012-0431-5-e DE-627 ger DE-627 rakwb eng Vafaie, Reza Hadjiaghaie verfasserin aut An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. Lab On a Chip (dpeaa)DE-He213 electroosmotic flow (dpeaa)DE-He213 low Reynolds number flow (dpeaa)DE-He213 chaotic regime (dpeaa)DE-He213 MEMS-based (dpeaa)DE-He213 surface micromachining (dpeaa)DE-He213 Mehdipoor, Mahnaz aut Pourmand, Adel aut Poorreza, Elnaz aut Ghavifekr, Habib Badri aut Enthalten in Biotechnology and bioprocess engineering Seoul : Society, 1996 18(2013), 3 vom: Juni, Seite 594-605 (DE-627)373321821 (DE-600)2125481-3 1976-3816 nnns volume:18 year:2013 number:3 month:06 pages:594-605 https://dx.doi.org/10.1007/s12257-012-0431-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 18 2013 3 06 594-605 |
| spelling |
10.1007/s12257-012-0431-5 doi (DE-627)SPR024560812 (SPR)s12257-012-0431-5-e DE-627 ger DE-627 rakwb eng Vafaie, Reza Hadjiaghaie verfasserin aut An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. Lab On a Chip (dpeaa)DE-He213 electroosmotic flow (dpeaa)DE-He213 low Reynolds number flow (dpeaa)DE-He213 chaotic regime (dpeaa)DE-He213 MEMS-based (dpeaa)DE-He213 surface micromachining (dpeaa)DE-He213 Mehdipoor, Mahnaz aut Pourmand, Adel aut Poorreza, Elnaz aut Ghavifekr, Habib Badri aut Enthalten in Biotechnology and bioprocess engineering Seoul : Society, 1996 18(2013), 3 vom: Juni, Seite 594-605 (DE-627)373321821 (DE-600)2125481-3 1976-3816 nnns volume:18 year:2013 number:3 month:06 pages:594-605 https://dx.doi.org/10.1007/s12257-012-0431-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 18 2013 3 06 594-605 |
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10.1007/s12257-012-0431-5 doi (DE-627)SPR024560812 (SPR)s12257-012-0431-5-e DE-627 ger DE-627 rakwb eng Vafaie, Reza Hadjiaghaie verfasserin aut An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. Lab On a Chip (dpeaa)DE-He213 electroosmotic flow (dpeaa)DE-He213 low Reynolds number flow (dpeaa)DE-He213 chaotic regime (dpeaa)DE-He213 MEMS-based (dpeaa)DE-He213 surface micromachining (dpeaa)DE-He213 Mehdipoor, Mahnaz aut Pourmand, Adel aut Poorreza, Elnaz aut Ghavifekr, Habib Badri aut Enthalten in Biotechnology and bioprocess engineering Seoul : Society, 1996 18(2013), 3 vom: Juni, Seite 594-605 (DE-627)373321821 (DE-600)2125481-3 1976-3816 nnns volume:18 year:2013 number:3 month:06 pages:594-605 https://dx.doi.org/10.1007/s12257-012-0431-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 18 2013 3 06 594-605 |
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10.1007/s12257-012-0431-5 doi (DE-627)SPR024560812 (SPR)s12257-012-0431-5-e DE-627 ger DE-627 rakwb eng Vafaie, Reza Hadjiaghaie verfasserin aut An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. Lab On a Chip (dpeaa)DE-He213 electroosmotic flow (dpeaa)DE-He213 low Reynolds number flow (dpeaa)DE-He213 chaotic regime (dpeaa)DE-He213 MEMS-based (dpeaa)DE-He213 surface micromachining (dpeaa)DE-He213 Mehdipoor, Mahnaz aut Pourmand, Adel aut Poorreza, Elnaz aut Ghavifekr, Habib Badri aut Enthalten in Biotechnology and bioprocess engineering Seoul : Society, 1996 18(2013), 3 vom: Juni, Seite 594-605 (DE-627)373321821 (DE-600)2125481-3 1976-3816 nnns volume:18 year:2013 number:3 month:06 pages:594-605 https://dx.doi.org/10.1007/s12257-012-0431-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 18 2013 3 06 594-605 |
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10.1007/s12257-012-0431-5 doi (DE-627)SPR024560812 (SPR)s12257-012-0431-5-e DE-627 ger DE-627 rakwb eng Vafaie, Reza Hadjiaghaie verfasserin aut An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. Lab On a Chip (dpeaa)DE-He213 electroosmotic flow (dpeaa)DE-He213 low Reynolds number flow (dpeaa)DE-He213 chaotic regime (dpeaa)DE-He213 MEMS-based (dpeaa)DE-He213 surface micromachining (dpeaa)DE-He213 Mehdipoor, Mahnaz aut Pourmand, Adel aut Poorreza, Elnaz aut Ghavifekr, Habib Badri aut Enthalten in Biotechnology and bioprocess engineering Seoul : Society, 1996 18(2013), 3 vom: Juni, Seite 594-605 (DE-627)373321821 (DE-600)2125481-3 1976-3816 nnns volume:18 year:2013 number:3 month:06 pages:594-605 https://dx.doi.org/10.1007/s12257-012-0431-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 18 2013 3 06 594-605 |
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Enthalten in Biotechnology and bioprocess engineering 18(2013), 3 vom: Juni, Seite 594-605 volume:18 year:2013 number:3 month:06 pages:594-605 |
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Enthalten in Biotechnology and bioprocess engineering 18(2013), 3 vom: Juni, Seite 594-605 volume:18 year:2013 number:3 month:06 pages:594-605 |
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Lab On a Chip electroosmotic flow low Reynolds number flow chaotic regime MEMS-based surface micromachining |
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Vafaie, Reza Hadjiaghaie @@aut@@ Mehdipoor, Mahnaz @@aut@@ Pourmand, Adel @@aut@@ Poorreza, Elnaz @@aut@@ Ghavifekr, Habib Badri @@aut@@ |
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Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. 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|
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Vafaie, Reza Hadjiaghaie |
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Vafaie, Reza Hadjiaghaie misc Lab On a Chip misc electroosmotic flow misc low Reynolds number flow misc chaotic regime misc MEMS-based misc surface micromachining An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining |
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An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining Lab On a Chip (dpeaa)DE-He213 electroosmotic flow (dpeaa)DE-He213 low Reynolds number flow (dpeaa)DE-He213 chaotic regime (dpeaa)DE-He213 MEMS-based (dpeaa)DE-He213 surface micromachining (dpeaa)DE-He213 |
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misc Lab On a Chip misc electroosmotic flow misc low Reynolds number flow misc chaotic regime misc MEMS-based misc surface micromachining |
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misc Lab On a Chip misc electroosmotic flow misc low Reynolds number flow misc chaotic regime misc MEMS-based misc surface micromachining |
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An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining |
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An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining |
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Vafaie, Reza Hadjiaghaie |
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Biotechnology and bioprocess engineering |
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Vafaie, Reza Hadjiaghaie Mehdipoor, Mahnaz Pourmand, Adel Poorreza, Elnaz Ghavifekr, Habib Badri |
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Vafaie, Reza Hadjiaghaie |
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10.1007/s12257-012-0431-5 |
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electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining |
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An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining |
| abstract |
Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 |
| abstractGer |
Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 |
| abstract_unstemmed |
Abstract In order to offer the ability of smaller volumes and high throughput in Lab-On-a-Chip and micro Total Analysis Systems devices, more miniaturized components are needed. Due to a low Reynolds number on the microscale, the mixing process can be particularly troublesome. This problem is compounded by the fact that more miniaturization can be challenging in a microfluidic system. In such a case, electroosmotic (EO) force is an efficient force to perturb low Reynolds number fluid. In this paper, a novel Micro-Electro-Mechanical-Systems (MEMS) based fabrication for microfluidic devices, and a more miniaturized micromixer are presented. The proposed technology process requires the covering of excited electrode patterns by a thin Silicon-Nitride ($ Si_{3} %$ N_{4} $) insulator layer. Fabrication parameters such as Low Pressure Chemical Vapor Deposition (LPCVD) $ Si_{3} %$ N_{4} $ deposition effect, and height of the Phosphor Silicate Glass (PSG) sacrificial layer were investigated for the electroosmotically-driven mixer. Particle tracing for fluid flow was illustrated, the particles were stretched and folded for a long time, which was a proof of chaotic regime. Finite Element Analysis (FEA) revealed that the mixer with covered electrodes provides the high mixing efficiency of above 90% for a 96 μm long microchannel. Using a silicon nitride insulator layer reduces high electric field gradient at sharp corners and edges of the electrodes, leading to the elimination of unwanted electrolyte effects. Thus, the excitation and geometrical parameters were optimized for the micromixer. © The Korean Society for Biotechnology and Bioengineering and Springer-Verlag Berlin Heidelberg 2013 |
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| title_short |
An electroosmotically-driven micromixer modified for high miniaturized microchannels using surface micromachining |
| url |
https://dx.doi.org/10.1007/s12257-012-0431-5 |
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| author2 |
Mehdipoor, Mahnaz Pourmand, Adel Poorreza, Elnaz Ghavifekr, Habib Badri |
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Mehdipoor, Mahnaz Pourmand, Adel Poorreza, Elnaz Ghavifekr, Habib Badri |
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| doi_str |
10.1007/s12257-012-0431-5 |
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2024-07-04T01:27:21.984Z |
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| score |
7.398576 |