Effect of permanganate treatment on through mold vias for an embedded wafer level package
Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for th...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Park, Se-Hoon [verfasserIn] Park, Ji-Yeon [verfasserIn] Kim, Young-Ho [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2013 |
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| Schlagwörter: |
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| Übergeordnetes Werk: |
Enthalten in: Electronic materials letters - Berlin : Springer, 2009, 9(2013), 4 vom: Juli, Seite 459-462 |
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| Übergeordnetes Werk: |
volume:9 ; year:2013 ; number:4 ; month:07 ; pages:459-462 |
| Links: |
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| DOI / URN: |
10.1007/s13391-013-0011-7 |
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| Katalog-ID: |
SPR031557104 |
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| 520 | |a Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. | ||
| 650 | 4 | |a through mold via (TMV) |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a desmear treatment |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a permanganate |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a laser drilling |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a electroless Cu plating |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a embedded wafer level package |7 (dpeaa)DE-He213 | |
| 700 | 1 | |a Park, Ji-Yeon |e verfasserin |4 aut | |
| 700 | 1 | |a Kim, Young-Ho |e verfasserin |4 aut | |
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2013 |
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10.1007/s13391-013-0011-7 doi (DE-627)SPR031557104 (SPR)s13391-013-0011-7-e DE-627 ger DE-627 rakwb eng 620 660 670 ASE Park, Se-Hoon verfasserin aut Effect of permanganate treatment on through mold vias for an embedded wafer level package 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. through mold via (TMV) (dpeaa)DE-He213 desmear treatment (dpeaa)DE-He213 permanganate (dpeaa)DE-He213 laser drilling (dpeaa)DE-He213 electroless Cu plating (dpeaa)DE-He213 embedded wafer level package (dpeaa)DE-He213 Park, Ji-Yeon verfasserin aut Kim, Young-Ho verfasserin aut Enthalten in Electronic materials letters Berlin : Springer, 2009 9(2013), 4 vom: Juli, Seite 459-462 (DE-627)656497157 (DE-600)2604508-4 2093-6788 nnns volume:9 year:2013 number:4 month:07 pages:459-462 https://dx.doi.org/10.1007/s13391-013-0011-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 9 2013 4 07 459-462 |
| spelling |
10.1007/s13391-013-0011-7 doi (DE-627)SPR031557104 (SPR)s13391-013-0011-7-e DE-627 ger DE-627 rakwb eng 620 660 670 ASE Park, Se-Hoon verfasserin aut Effect of permanganate treatment on through mold vias for an embedded wafer level package 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. through mold via (TMV) (dpeaa)DE-He213 desmear treatment (dpeaa)DE-He213 permanganate (dpeaa)DE-He213 laser drilling (dpeaa)DE-He213 electroless Cu plating (dpeaa)DE-He213 embedded wafer level package (dpeaa)DE-He213 Park, Ji-Yeon verfasserin aut Kim, Young-Ho verfasserin aut Enthalten in Electronic materials letters Berlin : Springer, 2009 9(2013), 4 vom: Juli, Seite 459-462 (DE-627)656497157 (DE-600)2604508-4 2093-6788 nnns volume:9 year:2013 number:4 month:07 pages:459-462 https://dx.doi.org/10.1007/s13391-013-0011-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 9 2013 4 07 459-462 |
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10.1007/s13391-013-0011-7 doi (DE-627)SPR031557104 (SPR)s13391-013-0011-7-e DE-627 ger DE-627 rakwb eng 620 660 670 ASE Park, Se-Hoon verfasserin aut Effect of permanganate treatment on through mold vias for an embedded wafer level package 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. through mold via (TMV) (dpeaa)DE-He213 desmear treatment (dpeaa)DE-He213 permanganate (dpeaa)DE-He213 laser drilling (dpeaa)DE-He213 electroless Cu plating (dpeaa)DE-He213 embedded wafer level package (dpeaa)DE-He213 Park, Ji-Yeon verfasserin aut Kim, Young-Ho verfasserin aut Enthalten in Electronic materials letters Berlin : Springer, 2009 9(2013), 4 vom: Juli, Seite 459-462 (DE-627)656497157 (DE-600)2604508-4 2093-6788 nnns volume:9 year:2013 number:4 month:07 pages:459-462 https://dx.doi.org/10.1007/s13391-013-0011-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 9 2013 4 07 459-462 |
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10.1007/s13391-013-0011-7 doi (DE-627)SPR031557104 (SPR)s13391-013-0011-7-e DE-627 ger DE-627 rakwb eng 620 660 670 ASE Park, Se-Hoon verfasserin aut Effect of permanganate treatment on through mold vias for an embedded wafer level package 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. through mold via (TMV) (dpeaa)DE-He213 desmear treatment (dpeaa)DE-He213 permanganate (dpeaa)DE-He213 laser drilling (dpeaa)DE-He213 electroless Cu plating (dpeaa)DE-He213 embedded wafer level package (dpeaa)DE-He213 Park, Ji-Yeon verfasserin aut Kim, Young-Ho verfasserin aut Enthalten in Electronic materials letters Berlin : Springer, 2009 9(2013), 4 vom: Juli, Seite 459-462 (DE-627)656497157 (DE-600)2604508-4 2093-6788 nnns volume:9 year:2013 number:4 month:07 pages:459-462 https://dx.doi.org/10.1007/s13391-013-0011-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 9 2013 4 07 459-462 |
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10.1007/s13391-013-0011-7 doi (DE-627)SPR031557104 (SPR)s13391-013-0011-7-e DE-627 ger DE-627 rakwb eng 620 660 670 ASE Park, Se-Hoon verfasserin aut Effect of permanganate treatment on through mold vias for an embedded wafer level package 2013 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. through mold via (TMV) (dpeaa)DE-He213 desmear treatment (dpeaa)DE-He213 permanganate (dpeaa)DE-He213 laser drilling (dpeaa)DE-He213 electroless Cu plating (dpeaa)DE-He213 embedded wafer level package (dpeaa)DE-He213 Park, Ji-Yeon verfasserin aut Kim, Young-Ho verfasserin aut Enthalten in Electronic materials letters Berlin : Springer, 2009 9(2013), 4 vom: Juli, Seite 459-462 (DE-627)656497157 (DE-600)2604508-4 2093-6788 nnns volume:9 year:2013 number:4 month:07 pages:459-462 https://dx.doi.org/10.1007/s13391-013-0011-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 9 2013 4 07 459-462 |
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Enthalten in Electronic materials letters 9(2013), 4 vom: Juli, Seite 459-462 volume:9 year:2013 number:4 month:07 pages:459-462 |
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Park, Se-Hoon |
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Park, Se-Hoon ddc 620 misc through mold via (TMV) misc desmear treatment misc permanganate misc laser drilling misc electroless Cu plating misc embedded wafer level package Effect of permanganate treatment on through mold vias for an embedded wafer level package |
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620 660 670 ASE Effect of permanganate treatment on through mold vias for an embedded wafer level package through mold via (TMV) (dpeaa)DE-He213 desmear treatment (dpeaa)DE-He213 permanganate (dpeaa)DE-He213 laser drilling (dpeaa)DE-He213 electroless Cu plating (dpeaa)DE-He213 embedded wafer level package (dpeaa)DE-He213 |
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ddc 620 misc through mold via (TMV) misc desmear treatment misc permanganate misc laser drilling misc electroless Cu plating misc embedded wafer level package |
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ddc 620 misc through mold via (TMV) misc desmear treatment misc permanganate misc laser drilling misc electroless Cu plating misc embedded wafer level package |
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Effect of permanganate treatment on through mold vias for an embedded wafer level package |
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Effect of permanganate treatment on through mold vias for an embedded wafer level package |
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Park, Se-Hoon Park, Ji-Yeon Kim, Young-Ho |
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effect of permanganate treatment on through mold vias for an embedded wafer level package |
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Effect of permanganate treatment on through mold vias for an embedded wafer level package |
| abstract |
Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. |
| abstractGer |
Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. |
| abstract_unstemmed |
Abstract In this study, a through mold via (TMV) interconnect was developed for an embedded wafer level package (EMWLP) to enable 3D packing applications. The effects of the shape and surface roughness of the epoxy molding wafer on the quality of electroless Cu metallization were investigated for the vertical interconnection. The mold compound is a composite material composed of epoxy resin and filler particles. Therefore, the effect of the amount of filler particles was studied to optimize the shape of the epoxy molding by applying two types of laser drilling modes. In addition, the electroless Cu plating process was optimized to deposit a Cu seed layer along the TMV sidewall. To optimize the TMV process, a desmear process was applied to improve the shape of the TMV sidewall and adhesion between the epoxy molding compound and the dielectric polymer for multilayer metallization. |
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4 |
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Effect of permanganate treatment on through mold vias for an embedded wafer level package |
| url |
https://dx.doi.org/10.1007/s13391-013-0011-7 |
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Park, Ji-Yeon Kim, Young-Ho |
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| doi_str |
10.1007/s13391-013-0011-7 |
| up_date |
2024-07-04T00:16:41.811Z |
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