Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices
Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^...
Ausführliche Beschreibung
Autor*in: |
Lin, Yow-Jon [verfasserIn] Wu, Chang-Lin [verfasserIn] Ke, Zun-Yuan [verfasserIn] Chang, Hsing-Cheng [verfasserIn] |
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Format: |
E-Artikel |
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Sprache: |
Englisch |
Erschienen: |
2019 |
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Schlagwörter: |
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Übergeordnetes Werk: |
Enthalten in: Indian journal of physics - New Delhi : Springer India, 2009, 94(2019), 8 vom: 07. Sept., Seite 1209-1214 |
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Übergeordnetes Werk: |
volume:94 ; year:2019 ; number:8 ; day:07 ; month:09 ; pages:1209-1214 |
Links: |
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DOI / URN: |
10.1007/s12648-019-01568-7 |
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Katalog-ID: |
SPR040391973 |
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520 | |a Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. | ||
650 | 4 | |a Polymer |7 (dpeaa)DE-He213 | |
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650 | 4 | |a Resistive switching |7 (dpeaa)DE-He213 | |
650 | 4 | |a Two-dimensional materials |7 (dpeaa)DE-He213 | |
700 | 1 | |a Wu, Chang-Lin |e verfasserin |4 aut | |
700 | 1 | |a Ke, Zun-Yuan |e verfasserin |4 aut | |
700 | 1 | |a Chang, Hsing-Cheng |e verfasserin |4 aut | |
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10.1007/s12648-019-01568-7 doi (DE-627)SPR040391973 (SPR)s12648-019-01568-7-e DE-627 ger DE-627 rakwb eng 530 ASE Lin, Yow-Jon verfasserin aut Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. Polymer (dpeaa)DE-He213 Electrical properties (dpeaa)DE-He213 Si (dpeaa)DE-He213 Thin films (dpeaa)DE-He213 Resistive switching (dpeaa)DE-He213 Two-dimensional materials (dpeaa)DE-He213 Wu, Chang-Lin verfasserin aut Ke, Zun-Yuan verfasserin aut Chang, Hsing-Cheng verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 94(2019), 8 vom: 07. Sept., Seite 1209-1214 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:94 year:2019 number:8 day:07 month:09 pages:1209-1214 https://dx.doi.org/10.1007/s12648-019-01568-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2019 8 07 09 1209-1214 |
spelling |
10.1007/s12648-019-01568-7 doi (DE-627)SPR040391973 (SPR)s12648-019-01568-7-e DE-627 ger DE-627 rakwb eng 530 ASE Lin, Yow-Jon verfasserin aut Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. Polymer (dpeaa)DE-He213 Electrical properties (dpeaa)DE-He213 Si (dpeaa)DE-He213 Thin films (dpeaa)DE-He213 Resistive switching (dpeaa)DE-He213 Two-dimensional materials (dpeaa)DE-He213 Wu, Chang-Lin verfasserin aut Ke, Zun-Yuan verfasserin aut Chang, Hsing-Cheng verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 94(2019), 8 vom: 07. Sept., Seite 1209-1214 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:94 year:2019 number:8 day:07 month:09 pages:1209-1214 https://dx.doi.org/10.1007/s12648-019-01568-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2019 8 07 09 1209-1214 |
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10.1007/s12648-019-01568-7 doi (DE-627)SPR040391973 (SPR)s12648-019-01568-7-e DE-627 ger DE-627 rakwb eng 530 ASE Lin, Yow-Jon verfasserin aut Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. Polymer (dpeaa)DE-He213 Electrical properties (dpeaa)DE-He213 Si (dpeaa)DE-He213 Thin films (dpeaa)DE-He213 Resistive switching (dpeaa)DE-He213 Two-dimensional materials (dpeaa)DE-He213 Wu, Chang-Lin verfasserin aut Ke, Zun-Yuan verfasserin aut Chang, Hsing-Cheng verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 94(2019), 8 vom: 07. Sept., Seite 1209-1214 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:94 year:2019 number:8 day:07 month:09 pages:1209-1214 https://dx.doi.org/10.1007/s12648-019-01568-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2019 8 07 09 1209-1214 |
allfieldsGer |
10.1007/s12648-019-01568-7 doi (DE-627)SPR040391973 (SPR)s12648-019-01568-7-e DE-627 ger DE-627 rakwb eng 530 ASE Lin, Yow-Jon verfasserin aut Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. Polymer (dpeaa)DE-He213 Electrical properties (dpeaa)DE-He213 Si (dpeaa)DE-He213 Thin films (dpeaa)DE-He213 Resistive switching (dpeaa)DE-He213 Two-dimensional materials (dpeaa)DE-He213 Wu, Chang-Lin verfasserin aut Ke, Zun-Yuan verfasserin aut Chang, Hsing-Cheng verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 94(2019), 8 vom: 07. Sept., Seite 1209-1214 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:94 year:2019 number:8 day:07 month:09 pages:1209-1214 https://dx.doi.org/10.1007/s12648-019-01568-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2019 8 07 09 1209-1214 |
allfieldsSound |
10.1007/s12648-019-01568-7 doi (DE-627)SPR040391973 (SPR)s12648-019-01568-7-e DE-627 ger DE-627 rakwb eng 530 ASE Lin, Yow-Jon verfasserin aut Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices 2019 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. Polymer (dpeaa)DE-He213 Electrical properties (dpeaa)DE-He213 Si (dpeaa)DE-He213 Thin films (dpeaa)DE-He213 Resistive switching (dpeaa)DE-He213 Two-dimensional materials (dpeaa)DE-He213 Wu, Chang-Lin verfasserin aut Ke, Zun-Yuan verfasserin aut Chang, Hsing-Cheng verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 94(2019), 8 vom: 07. Sept., Seite 1209-1214 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:94 year:2019 number:8 day:07 month:09 pages:1209-1214 https://dx.doi.org/10.1007/s12648-019-01568-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2019 8 07 09 1209-1214 |
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Enthalten in Indian journal of physics 94(2019), 8 vom: 07. Sept., Seite 1209-1214 volume:94 year:2019 number:8 day:07 month:09 pages:1209-1214 |
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Indian journal of physics |
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Lin, Yow-Jon @@aut@@ Wu, Chang-Lin @@aut@@ Ke, Zun-Yuan @@aut@@ Chang, Hsing-Cheng @@aut@@ |
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<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">SPR040391973</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20220111140227.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">201007s2019 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/s12648-019-01568-7</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)SPR040391973</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(SPR)s12648-019-01568-7-e</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">530</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Lin, Yow-Jon</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2019</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Polymer</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electrical properties</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Si</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Resistive switching</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Two-dimensional materials</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Wu, Chang-Lin</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Ke, Zun-Yuan</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chang, Hsing-Cheng</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Indian journal of physics</subfield><subfield code="d">New Delhi : Springer India, 2009</subfield><subfield code="g">94(2019), 8 vom: 07. 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|
author |
Lin, Yow-Jon |
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Lin, Yow-Jon ddc 530 misc Polymer misc Electrical properties misc Si misc Thin films misc Resistive switching misc Two-dimensional materials Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices |
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530 ASE Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices Polymer (dpeaa)DE-He213 Electrical properties (dpeaa)DE-He213 Si (dpeaa)DE-He213 Thin films (dpeaa)DE-He213 Resistive switching (dpeaa)DE-He213 Two-dimensional materials (dpeaa)DE-He213 |
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ddc 530 misc Polymer misc Electrical properties misc Si misc Thin films misc Resistive switching misc Two-dimensional materials |
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ddc 530 misc Polymer misc Electrical properties misc Si misc Thin films misc Resistive switching misc Two-dimensional materials |
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Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices |
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Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices |
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Lin, Yow-Jon |
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Indian journal of physics |
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Lin, Yow-Jon Wu, Chang-Lin Ke, Zun-Yuan Chang, Hsing-Cheng |
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verfasserin |
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effects of graphene content on resistive switching for au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type si devices |
title_auth |
Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices |
abstract |
Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. |
abstractGer |
Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. |
abstract_unstemmed |
Abstract This study determines the effect of incorporating reduced graphene oxide (RGO) nanosheets into poly(methyl methacrylate) (PMMA) on the resistive switching (RS) mechanisms by measuring the current–voltage characteristics for Au/PMMA/heavily doped p-type Si ($ p^{+} $-Si) and Au/PMMA:RGO/$ p^{+} $-Si devices. The effect of RGO content on the RS properties is also determined. The Au/PMMA/$ p^{+} $-Si device exhibits set/reset–free current–voltage characteristics because of the insulating properties of PMMA. However, the Au/PMMA:RGO/$ p^{+} $-Si device exhibits RS behavior. Incorporating RGO into PMMA results in an increase in conductivity, the formation of PMMA–RGO interfaces and a significant increase in the trap density at the PMMA/RGO interfaces, so the RS performance is improved for Au/PMMA:RGO/$ p^{+} $-Si devices. It is shown that the current density for Au/PMMA:RGO/$ p^{+} $-Si devices is limited by the combined effect of ohmic conduction, space-charge-limited current conduction and trap-filled limited current conduction. An excess amount of RGO in PMMA does not result in any memory effect during the forward- and reverse-biased sweeps because there is a significant increase in the conductivity of PMMA:RGO film. |
collection_details |
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container_issue |
8 |
title_short |
Effects of graphene content on resistive switching for Au/poly(methyl methacrylate): reduced graphene oxide/heavily doped p-type Si devices |
url |
https://dx.doi.org/10.1007/s12648-019-01568-7 |
remote_bool |
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author2 |
Wu, Chang-Lin Ke, Zun-Yuan Chang, Hsing-Cheng |
author2Str |
Wu, Chang-Lin Ke, Zun-Yuan Chang, Hsing-Cheng |
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doi_str |
10.1007/s12648-019-01568-7 |
up_date |
2024-07-03T15:41:40.608Z |
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|
score |
7.399599 |