Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces

Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite c...
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Autor*in:	An, Ning [verfasserIn] Wang, Kaiyang [verfasserIn] Wei, Haohan [verfasserIn] Song, Qinghai [verfasserIn] Xiao, Shumin [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2016

Übergeordnetes Werk:	Enthalten in: MRS communications - Berlin : Springer, 2011, 6(2016), 2 vom: 01. Juni, Seite 77-83
Übergeordnetes Werk:	volume:6 ; year:2016 ; number:2 ; day:01 ; month:06 ; pages:77-83

Links:	Volltext

DOI / URN:	10.1557/mrc.2016.13

Katalog-ID:	SPR040967840

Internformat


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520			\|a Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces.
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allfields	10.1557/mrc.2016.13 doi (DE-627)SPR040967840 (DE-599)SPRmrc.2016.13-e (SPR)mrc.2016.13-e DE-627 ger DE-627 rakwb eng 670 ASE An, Ning verfasserin aut Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces 2016 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces. Wang, Kaiyang verfasserin aut Wei, Haohan verfasserin aut Song, Qinghai verfasserin aut Xiao, Shumin verfasserin aut Enthalten in MRS communications Berlin : Springer, 2011 6(2016), 2 vom: 01. Juni, Seite 77-83 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:6 year:2016 number:2 day:01 month:06 pages:77-83 https://dx.doi.org/10.1557/mrc.2016.13 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_165 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_647 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2036 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2088 GBV_ILN_2089 GBV_ILN_2093 GBV_ILN_2098 GBV_ILN_2107 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2145 GBV_ILN_2158 GBV_ILN_2190 GBV_ILN_2193 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_2924 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4277 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4346 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 GBV_ILN_4753 AR 6 2016 2 01 06 77-83
spelling	10.1557/mrc.2016.13 doi (DE-627)SPR040967840 (DE-599)SPRmrc.2016.13-e (SPR)mrc.2016.13-e DE-627 ger DE-627 rakwb eng 670 ASE An, Ning verfasserin aut Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces 2016 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces. Wang, Kaiyang verfasserin aut Wei, Haohan verfasserin aut Song, Qinghai verfasserin aut Xiao, Shumin verfasserin aut Enthalten in MRS communications Berlin : Springer, 2011 6(2016), 2 vom: 01. Juni, Seite 77-83 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:6 year:2016 number:2 day:01 month:06 pages:77-83 https://dx.doi.org/10.1557/mrc.2016.13 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_165 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_647 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2036 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2088 GBV_ILN_2089 GBV_ILN_2093 GBV_ILN_2098 GBV_ILN_2107 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2145 GBV_ILN_2158 GBV_ILN_2190 GBV_ILN_2193 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_2924 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4277 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4346 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 GBV_ILN_4753 AR 6 2016 2 01 06 77-83
allfields_unstemmed	10.1557/mrc.2016.13 doi (DE-627)SPR040967840 (DE-599)SPRmrc.2016.13-e (SPR)mrc.2016.13-e DE-627 ger DE-627 rakwb eng 670 ASE An, Ning verfasserin aut Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces 2016 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces. Wang, Kaiyang verfasserin aut Wei, Haohan verfasserin aut Song, Qinghai verfasserin aut Xiao, Shumin verfasserin aut Enthalten in MRS communications Berlin : Springer, 2011 6(2016), 2 vom: 01. Juni, Seite 77-83 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:6 year:2016 number:2 day:01 month:06 pages:77-83 https://dx.doi.org/10.1557/mrc.2016.13 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_165 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_647 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2036 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2088 GBV_ILN_2089 GBV_ILN_2093 GBV_ILN_2098 GBV_ILN_2107 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2145 GBV_ILN_2158 GBV_ILN_2190 GBV_ILN_2193 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_2924 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4277 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4346 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 GBV_ILN_4753 AR 6 2016 2 01 06 77-83
allfieldsGer	10.1557/mrc.2016.13 doi (DE-627)SPR040967840 (DE-599)SPRmrc.2016.13-e (SPR)mrc.2016.13-e DE-627 ger DE-627 rakwb eng 670 ASE An, Ning verfasserin aut Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces 2016 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces. Wang, Kaiyang verfasserin aut Wei, Haohan verfasserin aut Song, Qinghai verfasserin aut Xiao, Shumin verfasserin aut Enthalten in MRS communications Berlin : Springer, 2011 6(2016), 2 vom: 01. Juni, Seite 77-83 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:6 year:2016 number:2 day:01 month:06 pages:77-83 https://dx.doi.org/10.1557/mrc.2016.13 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_165 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_647 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2036 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2088 GBV_ILN_2089 GBV_ILN_2093 GBV_ILN_2098 GBV_ILN_2107 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2145 GBV_ILN_2158 GBV_ILN_2190 GBV_ILN_2193 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_2924 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4277 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4346 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 GBV_ILN_4753 AR 6 2016 2 01 06 77-83
allfieldsSound	10.1557/mrc.2016.13 doi (DE-627)SPR040967840 (DE-599)SPRmrc.2016.13-e (SPR)mrc.2016.13-e DE-627 ger DE-627 rakwb eng 670 ASE An, Ning verfasserin aut Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces 2016 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces. Wang, Kaiyang verfasserin aut Wei, Haohan verfasserin aut Song, Qinghai verfasserin aut Xiao, Shumin verfasserin aut Enthalten in MRS communications Berlin : Springer, 2011 6(2016), 2 vom: 01. Juni, Seite 77-83 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:6 year:2016 number:2 day:01 month:06 pages:77-83 https://dx.doi.org/10.1557/mrc.2016.13 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_165 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_647 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2018 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2036 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2088 GBV_ILN_2089 GBV_ILN_2093 GBV_ILN_2098 GBV_ILN_2107 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2145 GBV_ILN_2158 GBV_ILN_2190 GBV_ILN_2193 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_2924 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4277 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4346 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 GBV_ILN_4753 AR 6 2016 2 01 06 77-83
language	English
source	Enthalten in MRS communications 6(2016), 2 vom: 01. Juni, Seite 77-83 volume:6 year:2016 number:2 day:01 month:06 pages:77-83
sourceStr	Enthalten in MRS communications 6(2016), 2 vom: 01. Juni, Seite 77-83 volume:6 year:2016 number:2 day:01 month:06 pages:77-83
format_phy_str_mv	Article
institution	findex.gbv.de
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container_title	MRS communications
authorswithroles_txt_mv	An, Ning @@aut@@ Wang, Kaiyang @@aut@@ Wei, Haohan @@aut@@ Song, Qinghai @@aut@@ Xiao, Shumin @@aut@@
publishDateDaySort_date	2016-06-01T00:00:00Z
hierarchy_top_id	683366432
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id	SPR040967840
language_de	englisch
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author	An, Ning
spellingShingle	An, Ning ddc 670 Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces
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topic_title	670 ASE Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces
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title	Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces
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title_full	Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces
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author_browse	An, Ning Wang, Kaiyang Wei, Haohan Song, Qinghai Xiao, Shumin
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title_sort	fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces
title_auth	Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces
abstract	Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces.
abstractGer	Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces.
abstract_unstemmed	Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces.
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title_short	Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces
url	https://dx.doi.org/10.1557/mrc.2016.13
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author2	Wang, Kaiyang Wei, Haohan Song, Qinghai Xiao, Shumin
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up_date	2024-07-03T19:25:05.092Z
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fullrecord_marcxml	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">SPR040967840</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20220112050921.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">201007s2016 xx \|\|\|\|\|o 00\| \|\|eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1557/mrc.2016.13</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)SPR040967840</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)SPRmrc.2016.13-e</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(SPR)mrc.2016.13-e</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">670</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">An, Ning</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2016</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide ($ TiO_{2} $) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality $ TiO_{2} $ films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality $ TiO_{2} $film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the $ TiO_{2} $ films. A predominately oriented $ TiO_{2} $ film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our $ TiO_{2} $ film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces.</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Wang, Kaiyang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Wei, Haohan</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Song, Qinghai</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Xiao, Shumin</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">MRS communications</subfield><subfield code="d">Berlin : Springer, 2011</subfield><subfield code="g">6(2016), 2 vom: 01. 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Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces

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