Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes

Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmiss...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Khatiri, Mahdieh [verfasserIn] Panahpour, Ali [verfasserIn] Razaghi, Hosein [verfasserIn] Bostandoust, E. [verfasserIn] Bananej, Alireza [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2020

Schlagwörter:	Optical thin films Nano-porous thin films Laser damage Silica thin films

Übergeordnetes Werk:	Enthalten in: Indian journal of physics - New Delhi : Springer India, 2009, 95(2020), 4 vom: 18. März, Seite 639-645
Übergeordnetes Werk:	volume:95 ; year:2020 ; number:4 ; day:18 ; month:03 ; pages:639-645

Links:	Volltext

DOI / URN:	10.1007/s12648-020-01725-3

Katalog-ID:	SPR043595413

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245	1	0	\|a Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes
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520			\|a Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction.
650		4	\|a Optical thin films \|7 (dpeaa)DE-He213
650		4	\|a Nano-porous thin films \|7 (dpeaa)DE-He213
650		4	\|a Laser damage \|7 (dpeaa)DE-He213
650		4	\|a Silica thin films \|7 (dpeaa)DE-He213
700	1		\|a Panahpour, Ali \|e verfasserin \|4 aut
700	1		\|a Razaghi, Hosein \|e verfasserin \|4 aut
700	1		\|a Bostandoust, E. \|e verfasserin \|4 aut
700	1		\|a Bananej, Alireza \|e verfasserin \|4 aut
773	0	8	\|i Enthalten in \|t Indian journal of physics \|d New Delhi : Springer India, 2009 \|g 95(2020), 4 vom: 18. März, Seite 639-645 \|w (DE-627)606030921 \|w (DE-600)2508021-0 \|x 0974-9845 \|7 nnns
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912			\|a GBV_ILN_65
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912			\|a GBV_ILN_110
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912			\|a GBV_ILN_138
912			\|a GBV_ILN_150
912			\|a GBV_ILN_151
912			\|a GBV_ILN_152
912			\|a GBV_ILN_161
912			\|a GBV_ILN_170
912			\|a GBV_ILN_171
912			\|a GBV_ILN_187
912			\|a GBV_ILN_213
912			\|a GBV_ILN_224
912			\|a GBV_ILN_230
912			\|a GBV_ILN_250
912			\|a GBV_ILN_281
912			\|a GBV_ILN_285
912			\|a GBV_ILN_293
912			\|a GBV_ILN_370
912			\|a GBV_ILN_602
912			\|a GBV_ILN_636
912			\|a GBV_ILN_702
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912			\|a GBV_ILN_2003
912			\|a GBV_ILN_2004
912			\|a GBV_ILN_2005
912			\|a GBV_ILN_2006
912			\|a GBV_ILN_2007
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912			\|a GBV_ILN_2009
912			\|a GBV_ILN_2010
912			\|a GBV_ILN_2011
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912			\|a GBV_ILN_2021
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912			\|a GBV_ILN_2037
912			\|a GBV_ILN_2038
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912			\|a GBV_ILN_4333
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matchkey_str	article:09749845:2020----::opooytdadhehlmaueetfaeidcdaaefaooosnielcieiiahni
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publishDate	2020
allfields	10.1007/s12648-020-01725-3 doi (DE-627)SPR043595413 (DE-599)SPRs12648-020-01725-3-e (SPR)s12648-020-01725-3-e DE-627 ger DE-627 rakwb eng 530 ASE Khatiri, Mahdieh verfasserin aut Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes 2020 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction. Optical thin films (dpeaa)DE-He213 Nano-porous thin films (dpeaa)DE-He213 Laser damage (dpeaa)DE-He213 Silica thin films (dpeaa)DE-He213 Panahpour, Ali verfasserin aut Razaghi, Hosein verfasserin aut Bostandoust, E. verfasserin aut Bananej, Alireza verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 95(2020), 4 vom: 18. März, Seite 639-645 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:95 year:2020 number:4 day:18 month:03 pages:639-645 https://dx.doi.org/10.1007/s12648-020-01725-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 95 2020 4 18 03 639-645
spelling	10.1007/s12648-020-01725-3 doi (DE-627)SPR043595413 (DE-599)SPRs12648-020-01725-3-e (SPR)s12648-020-01725-3-e DE-627 ger DE-627 rakwb eng 530 ASE Khatiri, Mahdieh verfasserin aut Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes 2020 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction. Optical thin films (dpeaa)DE-He213 Nano-porous thin films (dpeaa)DE-He213 Laser damage (dpeaa)DE-He213 Silica thin films (dpeaa)DE-He213 Panahpour, Ali verfasserin aut Razaghi, Hosein verfasserin aut Bostandoust, E. verfasserin aut Bananej, Alireza verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 95(2020), 4 vom: 18. März, Seite 639-645 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:95 year:2020 number:4 day:18 month:03 pages:639-645 https://dx.doi.org/10.1007/s12648-020-01725-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 95 2020 4 18 03 639-645
allfields_unstemmed	10.1007/s12648-020-01725-3 doi (DE-627)SPR043595413 (DE-599)SPRs12648-020-01725-3-e (SPR)s12648-020-01725-3-e DE-627 ger DE-627 rakwb eng 530 ASE Khatiri, Mahdieh verfasserin aut Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes 2020 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction. Optical thin films (dpeaa)DE-He213 Nano-porous thin films (dpeaa)DE-He213 Laser damage (dpeaa)DE-He213 Silica thin films (dpeaa)DE-He213 Panahpour, Ali verfasserin aut Razaghi, Hosein verfasserin aut Bostandoust, E. verfasserin aut Bananej, Alireza verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 95(2020), 4 vom: 18. März, Seite 639-645 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:95 year:2020 number:4 day:18 month:03 pages:639-645 https://dx.doi.org/10.1007/s12648-020-01725-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 95 2020 4 18 03 639-645
allfieldsGer	10.1007/s12648-020-01725-3 doi (DE-627)SPR043595413 (DE-599)SPRs12648-020-01725-3-e (SPR)s12648-020-01725-3-e DE-627 ger DE-627 rakwb eng 530 ASE Khatiri, Mahdieh verfasserin aut Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes 2020 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction. Optical thin films (dpeaa)DE-He213 Nano-porous thin films (dpeaa)DE-He213 Laser damage (dpeaa)DE-He213 Silica thin films (dpeaa)DE-He213 Panahpour, Ali verfasserin aut Razaghi, Hosein verfasserin aut Bostandoust, E. verfasserin aut Bananej, Alireza verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 95(2020), 4 vom: 18. März, Seite 639-645 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:95 year:2020 number:4 day:18 month:03 pages:639-645 https://dx.doi.org/10.1007/s12648-020-01725-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 95 2020 4 18 03 639-645
allfieldsSound	10.1007/s12648-020-01725-3 doi (DE-627)SPR043595413 (DE-599)SPRs12648-020-01725-3-e (SPR)s12648-020-01725-3-e DE-627 ger DE-627 rakwb eng 530 ASE Khatiri, Mahdieh verfasserin aut Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes 2020 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction. Optical thin films (dpeaa)DE-He213 Nano-porous thin films (dpeaa)DE-He213 Laser damage (dpeaa)DE-He213 Silica thin films (dpeaa)DE-He213 Panahpour, Ali verfasserin aut Razaghi, Hosein verfasserin aut Bostandoust, E. verfasserin aut Bananej, Alireza verfasserin aut Enthalten in Indian journal of physics New Delhi : Springer India, 2009 95(2020), 4 vom: 18. März, Seite 639-645 (DE-627)606030921 (DE-600)2508021-0 0974-9845 nnns volume:95 year:2020 number:4 day:18 month:03 pages:639-645 https://dx.doi.org/10.1007/s12648-020-01725-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 95 2020 4 18 03 639-645
language	English
source	Enthalten in Indian journal of physics 95(2020), 4 vom: 18. März, Seite 639-645 volume:95 year:2020 number:4 day:18 month:03 pages:639-645
sourceStr	Enthalten in Indian journal of physics 95(2020), 4 vom: 18. März, Seite 639-645 volume:95 year:2020 number:4 day:18 month:03 pages:639-645
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	Optical thin films Nano-porous thin films Laser damage Silica thin films
dewey-raw	530
isfreeaccess_bool	false
container_title	Indian journal of physics
authorswithroles_txt_mv	Khatiri, Mahdieh @@aut@@ Panahpour, Ali @@aut@@ Razaghi, Hosein @@aut@@ Bostandoust, E. @@aut@@ Bananej, Alireza @@aut@@
publishDateDaySort_date	2020-03-18T00:00:00Z
hierarchy_top_id	606030921
dewey-sort	3530
id	SPR043595413
language_de	englisch
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author	Khatiri, Mahdieh
spellingShingle	Khatiri, Mahdieh ddc 530 misc Optical thin films misc Nano-porous thin films misc Laser damage misc Silica thin films Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes
authorStr	Khatiri, Mahdieh
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topic_title	530 ASE Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes Optical thin films (dpeaa)DE-He213 Nano-porous thin films (dpeaa)DE-He213 Laser damage (dpeaa)DE-He213 Silica thin films (dpeaa)DE-He213
topic	ddc 530 misc Optical thin films misc Nano-porous thin films misc Laser damage misc Silica thin films
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title	Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes
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title_full	Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes
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author_browse	Khatiri, Mahdieh Panahpour, Ali Razaghi, Hosein Bostandoust, E. Bananej, Alireza
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title_sort	morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes
title_auth	Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes
abstract	Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction.
abstractGer	Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction.
abstract_unstemmed	Abstract Laser induced damage threshold (LIDT) of nano-porous antireflective silica thin films is measured using 10 ns laser pulses at λ = 532 nm. The thin films are prepared by dip-coating of BK7 substrates and then drying them by three different heating methods, to see how their LIDT and transmission are affected. Furthermore, using SEM imaging, the morphology of the laser induced damages is inspected and compared to those of similar samples, previously irradiated by femtosecond laser pulses at λ = 800 nm. The images evidently show that in the regions damaged by nanosecond pulses, the silica nanoparticles are melted and fused to each other, while in the samples irradiated by femtosecond pulses, the silica nanoparticles are sputtered and dispersed around, in the damaged area. The SEM images clearly demonstrate the different damage mechanisms involved in the nanosecond and femtosecond regimes of interaction.
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container_issue	4
title_short	Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes
url	https://dx.doi.org/10.1007/s12648-020-01725-3
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author2	Panahpour, Ali Razaghi, Hosein Bostandoust, E. Bananej, Alireza
author2Str	Panahpour, Ali Razaghi, Hosein Bostandoust, E. Bananej, Alireza
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doi_str	10.1007/s12648-020-01725-3
up_date	2024-07-03T19:40:25.447Z
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Morphology study and threshold measurement of laser induced damage of nano-porous antireflective silica thin films in nano- and femtosecond pulse regimes

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