Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells
Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requireme...
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Gespeichert in:
| Autor*in: |
Kimata, Yuto [verfasserIn] |
|---|
| Format: |
E-Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
2023 |
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| Schlagwörter: |
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| Anmerkung: |
© The Author(s) 2023 |
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| Übergeordnetes Werk: |
Enthalten in: Nanoscale research letters - New York, NY [u.a.] : Springer, 2006, 18(2023), 1 vom: 03. Mai |
|---|---|
| Übergeordnetes Werk: |
volume:18 ; year:2023 ; number:1 ; day:03 ; month:05 |
| Links: |
|---|
| DOI / URN: |
10.1186/s11671-023-03840-6 |
|---|
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SPR050278649 |
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| 520 | |a Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. | ||
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10.1186/s11671-023-03840-6 doi (DE-627)SPR050278649 (SPR)s11671-023-03840-6-e DE-627 ger DE-627 rakwb eng Kimata, Yuto verfasserin aut Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s) 2023 Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. Solar cell (dpeaa)DE-He213 Light trapping (dpeaa)DE-He213 Nanoimprint (dpeaa)DE-He213 Colloidal lithography (dpeaa)DE-He213 Dry etching (dpeaa)DE-He213 Gotoh, Kazuhiro aut Miyamoto, Satoru aut Kato, Shinya aut Kurokawa, Yasuyoshi aut Usami, Noritaka aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 18(2023), 1 vom: 03. Mai (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:18 year:2023 number:1 day:03 month:05 https://dx.doi.org/10.1186/s11671-023-03840-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_2027 AR 18 2023 1 03 05 |
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10.1186/s11671-023-03840-6 doi (DE-627)SPR050278649 (SPR)s11671-023-03840-6-e DE-627 ger DE-627 rakwb eng Kimata, Yuto verfasserin aut Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s) 2023 Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. Solar cell (dpeaa)DE-He213 Light trapping (dpeaa)DE-He213 Nanoimprint (dpeaa)DE-He213 Colloidal lithography (dpeaa)DE-He213 Dry etching (dpeaa)DE-He213 Gotoh, Kazuhiro aut Miyamoto, Satoru aut Kato, Shinya aut Kurokawa, Yasuyoshi aut Usami, Noritaka aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 18(2023), 1 vom: 03. Mai (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:18 year:2023 number:1 day:03 month:05 https://dx.doi.org/10.1186/s11671-023-03840-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_2027 AR 18 2023 1 03 05 |
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10.1186/s11671-023-03840-6 doi (DE-627)SPR050278649 (SPR)s11671-023-03840-6-e DE-627 ger DE-627 rakwb eng Kimata, Yuto verfasserin aut Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s) 2023 Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. Solar cell (dpeaa)DE-He213 Light trapping (dpeaa)DE-He213 Nanoimprint (dpeaa)DE-He213 Colloidal lithography (dpeaa)DE-He213 Dry etching (dpeaa)DE-He213 Gotoh, Kazuhiro aut Miyamoto, Satoru aut Kato, Shinya aut Kurokawa, Yasuyoshi aut Usami, Noritaka aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 18(2023), 1 vom: 03. Mai (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:18 year:2023 number:1 day:03 month:05 https://dx.doi.org/10.1186/s11671-023-03840-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_2027 AR 18 2023 1 03 05 |
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10.1186/s11671-023-03840-6 doi (DE-627)SPR050278649 (SPR)s11671-023-03840-6-e DE-627 ger DE-627 rakwb eng Kimata, Yuto verfasserin aut Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s) 2023 Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. Solar cell (dpeaa)DE-He213 Light trapping (dpeaa)DE-He213 Nanoimprint (dpeaa)DE-He213 Colloidal lithography (dpeaa)DE-He213 Dry etching (dpeaa)DE-He213 Gotoh, Kazuhiro aut Miyamoto, Satoru aut Kato, Shinya aut Kurokawa, Yasuyoshi aut Usami, Noritaka aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 18(2023), 1 vom: 03. Mai (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:18 year:2023 number:1 day:03 month:05 https://dx.doi.org/10.1186/s11671-023-03840-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_2027 AR 18 2023 1 03 05 |
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10.1186/s11671-023-03840-6 doi (DE-627)SPR050278649 (SPR)s11671-023-03840-6-e DE-627 ger DE-627 rakwb eng Kimata, Yuto verfasserin aut Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s) 2023 Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. Solar cell (dpeaa)DE-He213 Light trapping (dpeaa)DE-He213 Nanoimprint (dpeaa)DE-He213 Colloidal lithography (dpeaa)DE-He213 Dry etching (dpeaa)DE-He213 Gotoh, Kazuhiro aut Miyamoto, Satoru aut Kato, Shinya aut Kurokawa, Yasuyoshi aut Usami, Noritaka aut Enthalten in Nanoscale research letters New York, NY [u.a.] : Springer, 2006 18(2023), 1 vom: 03. Mai (DE-627)518632474 (DE-600)2253244-4 1556-276X nnns volume:18 year:2023 number:1 day:03 month:05 https://dx.doi.org/10.1186/s11671-023-03840-6 kostenfrei Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_2027 AR 18 2023 1 03 05 |
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Elektronische Aufsätze |
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Kimata, Yuto |
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10.1186/s11671-023-03840-6 |
| title_sort |
fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells |
| title_auth |
Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells |
| abstract |
Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. © The Author(s) 2023 |
| abstractGer |
Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. © The Author(s) 2023 |
| abstract_unstemmed |
Abstract Vehicle-integrated photovoltaics (VIPV) are gaining attention to realize a decarbonized society in the future, and the specifications for solar cells used in VIPV are predicated on a low cost, high efficiency, and the ability to be applied to curved surfaces. One way to meet these requirements is to make the silicon substrate thinner. However, thinner substrates result in lower near-infrared light absorption and lower efficiency. To increase light absorption, light trapping structures (LTSs) can be implemented. However, conventional alkali etched pyramid textures are not specialized for near-infrared light and are insufficient to improve near-infrared light absorption. Therefore, in this study, as an alternative to alkaline etching, we employed a nanoimprinting method that can easily fabricate submicron-sized LTSs on solar cells over a large area. In addition, as a master mold fabrication method with submicron-sized patterns, silica colloidal lithography was adopted. As a result, by controlling silica coverage, diameter of silica particles (D), and etching time (tet), the density, height, and size of LTSs could be controlled. At the silica coverage of 40%, D = 800 nm, and tet = 5 min, the reduction of reflectance below 65% at 1100 nm and the theoretical short-circuit current gain of 1.55 mA/$ cm^{2} $ was achieved. © The Author(s) 2023 |
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Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells |
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Gotoh, Kazuhiro Miyamoto, Satoru Kato, Shinya Kurokawa, Yasuyoshi Usami, Noritaka |
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Gotoh, Kazuhiro Miyamoto, Satoru Kato, Shinya Kurokawa, Yasuyoshi Usami, Noritaka |
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