Resistive Switching Effect in TaN/$ HfO_{x} $/Ni Memristors with a Filament Formed under Local Electron-Beam Crystallization

The influence of an intense electron beam on a nonstoichiometric oxide $ HfO_{x} $ (%$x \approx 1.8%$) layer of a TaN/$ HfO_{x} $/Ni memristor on its electrophysical properties is studied. It is found that the crystalline h-Hf, m‑$ HfO_{2} $, o-$ HfO_{2} $, and t-$ HfO_{2} $ phases are formed in the...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Voronkovskii, V. A. [verfasserIn]

Gerasimova, A. K.

Aliev, V. Sh.

Format:

E-Artikel

Sprache:

Englisch

Erschienen:

2023

Anmerkung:

© Pleiades Publishing, Inc. 2023. ISSN 0021-3640, JETP Letters, 2023, Vol. 117, No. 7, pp. 546–550. © Pleiades Publishing, Inc., 2023. Russian Text © The Author(s), 2023, published in Pis’ma v Zhurnal Eksperimental’noi i Teoreticheskoi Fiziki, 2023, Vol. 117, No. 7, pp. 550–555.

Übergeordnetes Werk:

Enthalten in: JETP letters - Heidelberg [u.a.] : Springer, 1975, 117(2023), 7 vom: Apr., Seite 546-550

Übergeordnetes Werk:

volume:117 ; year:2023 ; number:7 ; month:04 ; pages:546-550

Links:

Volltext

DOI / URN:

10.1134/S0021364023600593

Katalog-ID:

SPR051642034

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