Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes

Abstract Hydrogenated amorphous carbon (a-C:H) is a class of amorphous carbon with more than 30% hydrogen content and containing $ sp^{2} $ as well as $ sp^{3} $ carbon atoms. It is widely used as a hard mask in semiconductor device fabrication, protective coatings, lubricants, and biomedical applic...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Li, Jie [verfasserIn]

Chae, Heeyeop

Format:

E-Artikel

Sprache:

Englisch

Erschienen:

2023

Schlagwörter:

Hydrogenated Amorphous Carbon

sp

/sp

Ratio

Plasma Deposition

Plasma Characteristics

Anmerkung:

© The Korean Institute of Chemical Engineers 2023

Übergeordnetes Werk:

Enthalten in: The Korean journal of chemical engineering - Seoul : Inst., 1984, 40(2023), 6 vom: 17. Mai, Seite 1268-1276

Übergeordnetes Werk:

volume:40 ; year:2023 ; number:6 ; day:17 ; month:05 ; pages:1268-1276

Links:

Volltext

DOI / URN:

10.1007/s11814-023-1443-x

Katalog-ID:

SPR051897601

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