Modulating nanostructures in metals by magneton sputtering

Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsen...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Mao, Pengyan [verfasserIn] Cheng, Zhao Yu, Zhi Zhao, Hui Li, Hongda Tai, Kaiping

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2023

Schlagwörter:	Thin film Alloy Annealing Nanostructure

Anmerkung:	© The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.

Übergeordnetes Werk:	Enthalten in: MRS communications - Berlin : Springer, 2011, 13(2023), 3 vom: 10. Mai, Seite 492-499
Übergeordnetes Werk:	volume:13 ; year:2023 ; number:3 ; day:10 ; month:05 ; pages:492-499

Links:	Volltext

DOI / URN:	10.1557/s43579-023-00366-x

Katalog-ID:	SPR052102068

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520			\|a Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract
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allfields	10.1557/s43579-023-00366-x doi (DE-627)SPR052102068 (SPR)s43579-023-00366-x-e DE-627 ger DE-627 rakwb eng Mao, Pengyan verfasserin aut Modulating nanostructures in metals by magneton sputtering 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract Thin film (dpeaa)DE-He213 Alloy (dpeaa)DE-He213 Annealing (dpeaa)DE-He213 Nanostructure (dpeaa)DE-He213 Cheng, Zhao aut Yu, Zhi aut Zhao, Hui aut Li, Hongda aut Tai, Kaiping aut Enthalten in MRS communications Berlin : Springer, 2011 13(2023), 3 vom: 10. Mai, Seite 492-499 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:13 year:2023 number:3 day:10 month:05 pages:492-499 https://dx.doi.org/10.1557/s43579-023-00366-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 13 2023 3 10 05 492-499
spelling	10.1557/s43579-023-00366-x doi (DE-627)SPR052102068 (SPR)s43579-023-00366-x-e DE-627 ger DE-627 rakwb eng Mao, Pengyan verfasserin aut Modulating nanostructures in metals by magneton sputtering 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract Thin film (dpeaa)DE-He213 Alloy (dpeaa)DE-He213 Annealing (dpeaa)DE-He213 Nanostructure (dpeaa)DE-He213 Cheng, Zhao aut Yu, Zhi aut Zhao, Hui aut Li, Hongda aut Tai, Kaiping aut Enthalten in MRS communications Berlin : Springer, 2011 13(2023), 3 vom: 10. Mai, Seite 492-499 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:13 year:2023 number:3 day:10 month:05 pages:492-499 https://dx.doi.org/10.1557/s43579-023-00366-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 13 2023 3 10 05 492-499
allfields_unstemmed	10.1557/s43579-023-00366-x doi (DE-627)SPR052102068 (SPR)s43579-023-00366-x-e DE-627 ger DE-627 rakwb eng Mao, Pengyan verfasserin aut Modulating nanostructures in metals by magneton sputtering 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract Thin film (dpeaa)DE-He213 Alloy (dpeaa)DE-He213 Annealing (dpeaa)DE-He213 Nanostructure (dpeaa)DE-He213 Cheng, Zhao aut Yu, Zhi aut Zhao, Hui aut Li, Hongda aut Tai, Kaiping aut Enthalten in MRS communications Berlin : Springer, 2011 13(2023), 3 vom: 10. Mai, Seite 492-499 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:13 year:2023 number:3 day:10 month:05 pages:492-499 https://dx.doi.org/10.1557/s43579-023-00366-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 13 2023 3 10 05 492-499
allfieldsGer	10.1557/s43579-023-00366-x doi (DE-627)SPR052102068 (SPR)s43579-023-00366-x-e DE-627 ger DE-627 rakwb eng Mao, Pengyan verfasserin aut Modulating nanostructures in metals by magneton sputtering 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract Thin film (dpeaa)DE-He213 Alloy (dpeaa)DE-He213 Annealing (dpeaa)DE-He213 Nanostructure (dpeaa)DE-He213 Cheng, Zhao aut Yu, Zhi aut Zhao, Hui aut Li, Hongda aut Tai, Kaiping aut Enthalten in MRS communications Berlin : Springer, 2011 13(2023), 3 vom: 10. Mai, Seite 492-499 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:13 year:2023 number:3 day:10 month:05 pages:492-499 https://dx.doi.org/10.1557/s43579-023-00366-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 13 2023 3 10 05 492-499
allfieldsSound	10.1557/s43579-023-00366-x doi (DE-627)SPR052102068 (SPR)s43579-023-00366-x-e DE-627 ger DE-627 rakwb eng Mao, Pengyan verfasserin aut Modulating nanostructures in metals by magneton sputtering 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract Thin film (dpeaa)DE-He213 Alloy (dpeaa)DE-He213 Annealing (dpeaa)DE-He213 Nanostructure (dpeaa)DE-He213 Cheng, Zhao aut Yu, Zhi aut Zhao, Hui aut Li, Hongda aut Tai, Kaiping aut Enthalten in MRS communications Berlin : Springer, 2011 13(2023), 3 vom: 10. Mai, Seite 492-499 (DE-627)683366432 (DE-600)2645443-9 2159-6867 nnns volume:13 year:2023 number:3 day:10 month:05 pages:492-499 https://dx.doi.org/10.1557/s43579-023-00366-x lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_121 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_374 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 13 2023 3 10 05 492-499
language	English
source	Enthalten in MRS communications 13(2023), 3 vom: 10. Mai, Seite 492-499 volume:13 year:2023 number:3 day:10 month:05 pages:492-499
sourceStr	Enthalten in MRS communications 13(2023), 3 vom: 10. Mai, Seite 492-499 volume:13 year:2023 number:3 day:10 month:05 pages:492-499
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	Thin film Alloy Annealing Nanostructure
isfreeaccess_bool	false
container_title	MRS communications
authorswithroles_txt_mv	Mao, Pengyan @@aut@@ Cheng, Zhao @@aut@@ Yu, Zhi @@aut@@ Zhao, Hui @@aut@@ Li, Hongda @@aut@@ Tai, Kaiping @@aut@@
publishDateDaySort_date	2023-05-10T00:00:00Z
hierarchy_top_id	683366432
id	SPR052102068
language_de	englisch
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By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. 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author	Mao, Pengyan
spellingShingle	Mao, Pengyan misc Thin film misc Alloy misc Annealing misc Nanostructure Modulating nanostructures in metals by magneton sputtering
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topic_title	Modulating nanostructures in metals by magneton sputtering Thin film (dpeaa)DE-He213 Alloy (dpeaa)DE-He213 Annealing (dpeaa)DE-He213 Nanostructure (dpeaa)DE-He213
topic	misc Thin film misc Alloy misc Annealing misc Nanostructure
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title	Modulating nanostructures in metals by magneton sputtering
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title_full	Modulating nanostructures in metals by magneton sputtering
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author_browse	Mao, Pengyan Cheng, Zhao Yu, Zhi Zhao, Hui Li, Hongda Tai, Kaiping
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doi_str_mv	10.1557/s43579-023-00366-x
title_sort	modulating nanostructures in metals by magneton sputtering
title_auth	Modulating nanostructures in metals by magneton sputtering
abstract	Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
abstractGer	Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
abstract_unstemmed	Here, we report an effective nanostructures modulation strategy by W alloying and annealing treatment in Cu films deposited by magnetron sputtering. The as-deposited Cu and Cu–W films exhibit nanograins with comparable grain sizes. After annealing, nanograins in the Cu film are substantially coarsened accompanying with nano-twinned structure formation. While nanograins survive in annealed Cu–W films due to the pinning effect of W atoms on grain boundary migration. By increasing W content and/or annealing temperature, W particles segregation intensifies, and hybrid nanostructures are formed composed of nanoparticles and nanograins. Our findings can provide strategical guidance for fabricating high-performance nanostructured materials. Graphical abstract © The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
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title_short	Modulating nanostructures in metals by magneton sputtering
url	https://dx.doi.org/10.1557/s43579-023-00366-x
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author2	Cheng, Zhao Yu, Zhi Zhao, Hui Li, Hongda Tai, Kaiping
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doi_str	10.1557/s43579-023-00366-x
up_date	2024-07-04T01:16:55.806Z
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