Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment
• Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of mo...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Ali, Kamran [verfasserIn] |
|---|
| Format: |
E-Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
2014 |
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| Schlagwörter: |
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| Umfang: |
8 |
|---|
| Übergeordnetes Werk: |
Enthalten in: Characterising shape patterns using features derived from best-fitting ellipsoids - Gontar, Amelia ELSEVIER, 2018, a journal devoted to applied physics and chemistry of surfaces and interfaces, Amsterdam |
|---|---|
| Übergeordnetes Werk: |
volume:305 ; year:2014 ; day:30 ; month:06 ; pages:554-561 ; extent:8 |
| Links: |
|---|
| DOI / URN: |
10.1016/j.apsusc.2014.03.135 |
|---|
| Katalog-ID: |
ELV022495223 |
|---|
| LEADER | 01000caa a22002652 4500 | ||
|---|---|---|---|
| 001 | ELV022495223 | ||
| 003 | DE-627 | ||
| 005 | 20230623164053.0 | ||
| 007 | cr uuu---uuuuu | ||
| 008 | 180603s2014 xx |||||o 00| ||eng c | ||
| 024 | 7 | |a 10.1016/j.apsusc.2014.03.135 |2 doi | |
| 028 | 5 | 2 | |a GBVA2014006000010.pica |
| 035 | |a (DE-627)ELV022495223 | ||
| 035 | |a (ELSEVIER)S0169-4332(14)00686-2 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
| 041 | |a eng | ||
| 082 | 0 | |a 670 |a 530 |a 660 | |
| 082 | 0 | 4 | |a 670 |q DE-600 |
| 082 | 0 | 4 | |a 530 |q DE-600 |
| 082 | 0 | 4 | |a 660 |q DE-600 |
| 082 | 0 | 4 | |a 000 |a 150 |q VZ |
| 084 | |a 54.74 |2 bkl | ||
| 100 | 1 | |a Ali, Kamran |e verfasserin |4 aut | |
| 245 | 1 | 0 | |a Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment |
| 264 | 1 | |c 2014 | |
| 300 | |a 8 | ||
| 336 | |a nicht spezifiziert |b zzz |2 rdacontent | ||
| 337 | |a nicht spezifiziert |b z |2 rdamedia | ||
| 338 | |a nicht spezifiziert |b zu |2 rdacarrier | ||
| 520 | |a • Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. | ||
| 650 | 7 | |a Al2O3 |2 Elsevier | |
| 650 | 7 | |a Atomic layer deposition |2 Elsevier | |
| 650 | 7 | |a PEN |2 Elsevier | |
| 650 | 7 | |a C3F8 |2 Elsevier | |
| 650 | 7 | |a Hydrophobicity |2 Elsevier | |
| 650 | 7 | |a Contact angle |2 Elsevier | |
| 700 | 1 | |a Choi, Kyung-Hyun |4 oth | |
| 700 | 1 | |a Kim, Chang Young |4 oth | |
| 700 | 1 | |a Doh, Yang Hoi |4 oth | |
| 700 | 1 | |a Jo, Jeongdai |4 oth | |
| 773 | 0 | 8 | |i Enthalten in |n Elsevier |a Gontar, Amelia ELSEVIER |t Characterising shape patterns using features derived from best-fitting ellipsoids |d 2018 |d a journal devoted to applied physics and chemistry of surfaces and interfaces |g Amsterdam |w (DE-627)ELV000097942 |
| 773 | 1 | 8 | |g volume:305 |g year:2014 |g day:30 |g month:06 |g pages:554-561 |g extent:8 |
| 856 | 4 | 0 | |u https://doi.org/10.1016/j.apsusc.2014.03.135 |3 Volltext |
| 912 | |a GBV_USEFLAG_U | ||
| 912 | |a GBV_ELV | ||
| 912 | |a SYSFLAG_U | ||
| 936 | b | k | |a 54.74 |j Maschinelles Sehen |q VZ |
| 951 | |a AR | ||
| 952 | |d 305 |j 2014 |b 30 |c 0630 |h 554-561 |g 8 | ||
| 953 | |2 045F |a 670 | ||
| author_variant |
k a ka |
|---|---|
| matchkey_str |
alikamranchoikyunghyunkimchangyoungdohya:2014----:yrpoiiynacmnoa23hnimdpstdnoyeisbtaebaoilyreoiini |
| hierarchy_sort_str |
2014 |
| bklnumber |
54.74 |
| publishDate |
2014 |
| allfields |
10.1016/j.apsusc.2014.03.135 doi GBVA2014006000010.pica (DE-627)ELV022495223 (ELSEVIER)S0169-4332(14)00686-2 DE-627 ger DE-627 rakwb eng 670 530 660 670 DE-600 530 DE-600 660 DE-600 000 150 VZ 54.74 bkl Ali, Kamran verfasserin aut Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment 2014 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier • Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle Elsevier Choi, Kyung-Hyun oth Kim, Chang Young oth Doh, Yang Hoi oth Jo, Jeongdai oth Enthalten in Elsevier Gontar, Amelia ELSEVIER Characterising shape patterns using features derived from best-fitting ellipsoids 2018 a journal devoted to applied physics and chemistry of surfaces and interfaces Amsterdam (DE-627)ELV000097942 volume:305 year:2014 day:30 month:06 pages:554-561 extent:8 https://doi.org/10.1016/j.apsusc.2014.03.135 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U 54.74 Maschinelles Sehen VZ AR 305 2014 30 0630 554-561 8 045F 670 |
| spelling |
10.1016/j.apsusc.2014.03.135 doi GBVA2014006000010.pica (DE-627)ELV022495223 (ELSEVIER)S0169-4332(14)00686-2 DE-627 ger DE-627 rakwb eng 670 530 660 670 DE-600 530 DE-600 660 DE-600 000 150 VZ 54.74 bkl Ali, Kamran verfasserin aut Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment 2014 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier • Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle Elsevier Choi, Kyung-Hyun oth Kim, Chang Young oth Doh, Yang Hoi oth Jo, Jeongdai oth Enthalten in Elsevier Gontar, Amelia ELSEVIER Characterising shape patterns using features derived from best-fitting ellipsoids 2018 a journal devoted to applied physics and chemistry of surfaces and interfaces Amsterdam (DE-627)ELV000097942 volume:305 year:2014 day:30 month:06 pages:554-561 extent:8 https://doi.org/10.1016/j.apsusc.2014.03.135 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U 54.74 Maschinelles Sehen VZ AR 305 2014 30 0630 554-561 8 045F 670 |
| allfields_unstemmed |
10.1016/j.apsusc.2014.03.135 doi GBVA2014006000010.pica (DE-627)ELV022495223 (ELSEVIER)S0169-4332(14)00686-2 DE-627 ger DE-627 rakwb eng 670 530 660 670 DE-600 530 DE-600 660 DE-600 000 150 VZ 54.74 bkl Ali, Kamran verfasserin aut Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment 2014 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier • Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle Elsevier Choi, Kyung-Hyun oth Kim, Chang Young oth Doh, Yang Hoi oth Jo, Jeongdai oth Enthalten in Elsevier Gontar, Amelia ELSEVIER Characterising shape patterns using features derived from best-fitting ellipsoids 2018 a journal devoted to applied physics and chemistry of surfaces and interfaces Amsterdam (DE-627)ELV000097942 volume:305 year:2014 day:30 month:06 pages:554-561 extent:8 https://doi.org/10.1016/j.apsusc.2014.03.135 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U 54.74 Maschinelles Sehen VZ AR 305 2014 30 0630 554-561 8 045F 670 |
| allfieldsGer |
10.1016/j.apsusc.2014.03.135 doi GBVA2014006000010.pica (DE-627)ELV022495223 (ELSEVIER)S0169-4332(14)00686-2 DE-627 ger DE-627 rakwb eng 670 530 660 670 DE-600 530 DE-600 660 DE-600 000 150 VZ 54.74 bkl Ali, Kamran verfasserin aut Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment 2014 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier • Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle Elsevier Choi, Kyung-Hyun oth Kim, Chang Young oth Doh, Yang Hoi oth Jo, Jeongdai oth Enthalten in Elsevier Gontar, Amelia ELSEVIER Characterising shape patterns using features derived from best-fitting ellipsoids 2018 a journal devoted to applied physics and chemistry of surfaces and interfaces Amsterdam (DE-627)ELV000097942 volume:305 year:2014 day:30 month:06 pages:554-561 extent:8 https://doi.org/10.1016/j.apsusc.2014.03.135 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U 54.74 Maschinelles Sehen VZ AR 305 2014 30 0630 554-561 8 045F 670 |
| allfieldsSound |
10.1016/j.apsusc.2014.03.135 doi GBVA2014006000010.pica (DE-627)ELV022495223 (ELSEVIER)S0169-4332(14)00686-2 DE-627 ger DE-627 rakwb eng 670 530 660 670 DE-600 530 DE-600 660 DE-600 000 150 VZ 54.74 bkl Ali, Kamran verfasserin aut Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment 2014 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier • Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle Elsevier Choi, Kyung-Hyun oth Kim, Chang Young oth Doh, Yang Hoi oth Jo, Jeongdai oth Enthalten in Elsevier Gontar, Amelia ELSEVIER Characterising shape patterns using features derived from best-fitting ellipsoids 2018 a journal devoted to applied physics and chemistry of surfaces and interfaces Amsterdam (DE-627)ELV000097942 volume:305 year:2014 day:30 month:06 pages:554-561 extent:8 https://doi.org/10.1016/j.apsusc.2014.03.135 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U 54.74 Maschinelles Sehen VZ AR 305 2014 30 0630 554-561 8 045F 670 |
| language |
English |
| source |
Enthalten in Characterising shape patterns using features derived from best-fitting ellipsoids Amsterdam volume:305 year:2014 day:30 month:06 pages:554-561 extent:8 |
| sourceStr |
Enthalten in Characterising shape patterns using features derived from best-fitting ellipsoids Amsterdam volume:305 year:2014 day:30 month:06 pages:554-561 extent:8 |
| format_phy_str_mv |
Article |
| bklname |
Maschinelles Sehen |
| institution |
findex.gbv.de |
| topic_facet |
Al2O3 Atomic layer deposition PEN C3F8 Hydrophobicity Contact angle |
| dewey-raw |
670 |
| isfreeaccess_bool |
false |
| container_title |
Characterising shape patterns using features derived from best-fitting ellipsoids |
| authorswithroles_txt_mv |
Ali, Kamran @@aut@@ Choi, Kyung-Hyun @@oth@@ Kim, Chang Young @@oth@@ Doh, Yang Hoi @@oth@@ Jo, Jeongdai @@oth@@ |
| publishDateDaySort_date |
2014-01-30T00:00:00Z |
| hierarchy_top_id |
ELV000097942 |
| dewey-sort |
3670 |
| id |
ELV022495223 |
| language_de |
englisch |
| fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">ELV022495223</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230623164053.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">180603s2014 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1016/j.apsusc.2014.03.135</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">GBVA2014006000010.pica</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)ELV022495223</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ELSEVIER)S0169-4332(14)00686-2</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">670</subfield><subfield code="a">530</subfield><subfield code="a">660</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">670</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">530</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">660</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">000</subfield><subfield code="a">150</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">54.74</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Ali, Kamran</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">8</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">• Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%.</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Al2O3</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Atomic layer deposition</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">PEN</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">C3F8</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Hydrophobicity</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Contact angle</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Choi, Kyung-Hyun</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kim, Chang Young</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Doh, Yang Hoi</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Jo, Jeongdai</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="n">Elsevier</subfield><subfield code="a">Gontar, Amelia ELSEVIER</subfield><subfield code="t">Characterising shape patterns using features derived from best-fitting ellipsoids</subfield><subfield code="d">2018</subfield><subfield code="d">a journal devoted to applied physics and chemistry of surfaces and interfaces</subfield><subfield code="g">Amsterdam</subfield><subfield code="w">(DE-627)ELV000097942</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:305</subfield><subfield code="g">year:2014</subfield><subfield code="g">day:30</subfield><subfield code="g">month:06</subfield><subfield code="g">pages:554-561</subfield><subfield code="g">extent:8</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1016/j.apsusc.2014.03.135</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ELV</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_U</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">54.74</subfield><subfield code="j">Maschinelles Sehen</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">305</subfield><subfield code="j">2014</subfield><subfield code="b">30</subfield><subfield code="c">0630</subfield><subfield code="h">554-561</subfield><subfield code="g">8</subfield></datafield><datafield tag="953" ind1=" " ind2=" "><subfield code="2">045F</subfield><subfield code="a">670</subfield></datafield></record></collection>
|
| author |
Ali, Kamran |
| spellingShingle |
Ali, Kamran ddc 670 ddc 530 ddc 660 ddc 000 bkl 54.74 Elsevier Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment |
| authorStr |
Ali, Kamran |
| ppnlink_with_tag_str_mv |
@@773@@(DE-627)ELV000097942 |
| format |
electronic Article |
| dewey-ones |
670 - Manufacturing 530 - Physics 660 - Chemical engineering 000 - Computer science, information & general works 150 - Psychology |
| delete_txt_mv |
keep |
| author_role |
aut |
| collection |
elsevier |
| remote_str |
true |
| illustrated |
Not Illustrated |
| topic_title |
670 530 660 670 DE-600 530 DE-600 660 DE-600 000 150 VZ 54.74 bkl Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle Elsevier |
| topic |
ddc 670 ddc 530 ddc 660 ddc 000 bkl 54.74 Elsevier Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle |
| topic_unstemmed |
ddc 670 ddc 530 ddc 660 ddc 000 bkl 54.74 Elsevier Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle |
| topic_browse |
ddc 670 ddc 530 ddc 660 ddc 000 bkl 54.74 Elsevier Al2O3 Elsevier Atomic layer deposition Elsevier PEN Elsevier C3F8 Elsevier Hydrophobicity Elsevier Contact angle |
| format_facet |
Elektronische Aufsätze Aufsätze Elektronische Ressource |
| format_main_str_mv |
Text Zeitschrift/Artikel |
| carriertype_str_mv |
zu |
| author2_variant |
k h c khc c y k cy cyk y h d yh yhd j j jj |
| hierarchy_parent_title |
Characterising shape patterns using features derived from best-fitting ellipsoids |
| hierarchy_parent_id |
ELV000097942 |
| dewey-tens |
670 - Manufacturing 530 - Physics 660 - Chemical engineering 000 - Computer science, knowledge & systems 150 - Psychology |
| hierarchy_top_title |
Characterising shape patterns using features derived from best-fitting ellipsoids |
| isfreeaccess_txt |
false |
| familylinks_str_mv |
(DE-627)ELV000097942 |
| title |
Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment |
| ctrlnum |
(DE-627)ELV022495223 (ELSEVIER)S0169-4332(14)00686-2 |
| title_full |
Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment |
| author_sort |
Ali, Kamran |
| journal |
Characterising shape patterns using features derived from best-fitting ellipsoids |
| journalStr |
Characterising shape patterns using features derived from best-fitting ellipsoids |
| lang_code |
eng |
| isOA_bool |
false |
| dewey-hundreds |
600 - Technology 500 - Science 000 - Computer science, information & general works 100 - Philosophy & psychology |
| recordtype |
marc |
| publishDateSort |
2014 |
| contenttype_str_mv |
zzz |
| container_start_page |
554 |
| author_browse |
Ali, Kamran |
| container_volume |
305 |
| physical |
8 |
| class |
670 530 660 670 DE-600 530 DE-600 660 DE-600 000 150 VZ 54.74 bkl |
| format_se |
Elektronische Aufsätze |
| author-letter |
Ali, Kamran |
| doi_str_mv |
10.1016/j.apsusc.2014.03.135 |
| dewey-full |
670 530 660 000 150 |
| title_sort |
hydrophobicity enhancement of al2o3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment |
| title_auth |
Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment |
| abstract |
• Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. |
| abstractGer |
• Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. |
| abstract_unstemmed |
• Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%. |
| collection_details |
GBV_USEFLAG_U GBV_ELV SYSFLAG_U |
| title_short |
Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment |
| url |
https://doi.org/10.1016/j.apsusc.2014.03.135 |
| remote_bool |
true |
| author2 |
Choi, Kyung-Hyun Kim, Chang Young Doh, Yang Hoi Jo, Jeongdai |
| author2Str |
Choi, Kyung-Hyun Kim, Chang Young Doh, Yang Hoi Jo, Jeongdai |
| ppnlink |
ELV000097942 |
| mediatype_str_mv |
z |
| isOA_txt |
false |
| hochschulschrift_bool |
false |
| author2_role |
oth oth oth oth |
| doi_str |
10.1016/j.apsusc.2014.03.135 |
| up_date |
2024-07-06T22:07:33.539Z |
| _version_ |
1803869123814359040 |
| fullrecord_marcxml |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">ELV022495223</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230623164053.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">180603s2014 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1016/j.apsusc.2014.03.135</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">GBVA2014006000010.pica</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)ELV022495223</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ELSEVIER)S0169-4332(14)00686-2</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">670</subfield><subfield code="a">530</subfield><subfield code="a">660</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">670</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">530</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">660</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">000</subfield><subfield code="a">150</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">54.74</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Ali, Kamran</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">8</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">• Good quality Al2O3 thin films are fabricated on PEN substrates through ALD. • Hydrophobicity of Al2O3 films has been enhanced greatly by C3F8 plasma treatment. • C3F8 plasma treated films have retained good surface morphology. • C3F8 plasma treated films have shown high optical transmittance of more than 90%.</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Al2O3</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Atomic layer deposition</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">PEN</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">C3F8</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Hydrophobicity</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Contact angle</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Choi, Kyung-Hyun</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kim, Chang Young</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Doh, Yang Hoi</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Jo, Jeongdai</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="n">Elsevier</subfield><subfield code="a">Gontar, Amelia ELSEVIER</subfield><subfield code="t">Characterising shape patterns using features derived from best-fitting ellipsoids</subfield><subfield code="d">2018</subfield><subfield code="d">a journal devoted to applied physics and chemistry of surfaces and interfaces</subfield><subfield code="g">Amsterdam</subfield><subfield code="w">(DE-627)ELV000097942</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:305</subfield><subfield code="g">year:2014</subfield><subfield code="g">day:30</subfield><subfield code="g">month:06</subfield><subfield code="g">pages:554-561</subfield><subfield code="g">extent:8</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1016/j.apsusc.2014.03.135</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ELV</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_U</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">54.74</subfield><subfield code="j">Maschinelles Sehen</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">305</subfield><subfield code="j">2014</subfield><subfield code="b">30</subfield><subfield code="c">0630</subfield><subfield code="h">554-561</subfield><subfield code="g">8</subfield></datafield><datafield tag="953" ind1=" " ind2=" "><subfield code="2">045F</subfield><subfield code="a">670</subfield></datafield></record></collection>
|
| score |
7.401311 |